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Loading effect and solutions in gate etching process for TFT
Device Physics and Device Preparation | 更新时间:2023-08-10
    • Loading effect and solutions in gate etching process for TFT

    • Chinese Journal of Liquid Crystals and Displays   Vol. 38, Issue 8, Pages: 1054-1061(2023)
    • DOI:10.37188/CJLCD.2023-0105    

      CLC: TN321+.5
    • Received:22 March 2023

      Revised:20 April 2023

      Published:05 August 2023

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  • LIU Dan, HUANG Zhong-hao, HUANG Sheng, et al. Loading effect and solutions in gate etching process for TFT[J]. Chinese journal of liquid crystals and displays, 2023, 38(8): 1054-1061. DOI: 10.37188/CJLCD.2023-0105.

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