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Fabrication of photomask based on patterned guest-host liquid crystal
Device Physics and Device Preparation | 更新时间：2025-06-05

    • Fabrication of photomask based on patterned guest-host liquid crystal

    • “New breakthroughs have been made in the field of micro nano structure manufacturing, with experts designing masks based on patterned oriented guest host liquid crystals to achieve precise manufacturing of micro scale structures, providing new ideas for low-cost microstructure processing.”
    • Chinese Journal of Liquid Crystals and Displays   Vol. 40, Issue 6, Pages: 846-853(2025)

    • DOI：10.37188/CJLCD.2025-0050    

      CLC： O753+.2;O436
    • CSTR：32172.14.CJLCD.2025-0050    

    • Received：05 March 2025，

      Revised：21 March 2025，

      Published：05 June 2025

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  • WANG Junhui, LIU Xuan, DUAN Xia, et al. Fabrication of photomask based on patterned guest-host liquid crystal[J]. Chinese journal of liquid crystals and displays, 2025, 40(6): 846-853. DOI： 10.37188/CJLCD.2025-0050. CSTR： 32172.14.CJLCD.2025-0050.

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Related Author

YUAN Conglong
LI Boyuan
DUAN Xia
LIU Xuan
HU Honglong
WANG Zhaoyi
CHENG Hongbo
YUAN Conglong

Related Institution

School of Chemistry and Molecular Engineering， East China University of Science and Technology
Department of Physics， East China University of Science and Technology
Heze Vocational College
College of Engineering and Applied Sciences, Nanjing University
East China University of Science and Technology， Department of Physics
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