Influence of active layer thickness on performance of Al-Zn-Sn-O thin-film transistors and inverters
Device Physics and Device Preparation|更新时间:2025-09-08
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Influence of active layer thickness on performance of Al-Zn-Sn-O thin-film transistors and inverters
“The latest research reveals that the performance of aluminum zinc tin oxide thin film transistors significantly improves with the optimization of active layer thickness, providing new ideas for logic circuit applications.”
Chinese Journal of Liquid Crystals and DisplaysVol. 40, Issue 9, Pages: 1258-1267(2025)
作者机构:
1.吉林建筑大学 寒地建筑综合节能教育部重点实验室, 吉林 长春 130118
2.吉林建筑大学 电气与计算机学院, 吉林 长春 130118
作者简介:
基金信息:
Science and Technology Development Plan of Jilin Province(YDZJ202301ZYTS489)
KU Laizhe, WANG Chao, GUO Liang, et al. Influence of active layer thickness on performance of Al-Zn-Sn-O thin-film transistors and inverters[J]. Chinese journal of liquid crystals and displays, 2025, 40(9): 1258-1267.
DOI:
KU Laizhe, WANG Chao, GUO Liang, et al. Influence of active layer thickness on performance of Al-Zn-Sn-O thin-film transistors and inverters[J]. Chinese journal of liquid crystals and displays, 2025, 40(9): 1258-1267. DOI: 10.37188/CJLCD.2025-0133. CSTR: 32172.14.CJLCD.2025-0133.
Influence of active layer thickness on performance of Al-Zn-Sn-O thin-film transistors and inverters
Research and Progress in Transparent Amorphous Oxide Semiconductor Thin Film Transistors
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