关于液晶联动的分析研究

苗丹丹; 董安鑫; 谭聪; 任文明; 陆相晚; 黄寅虎; 王章涛; 唐文浩

doi:10.3788/YJYXS20173207.0543

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关于液晶联动的分析研究

材料科学 | 更新时间：2020-08-12

- 关于液晶联动的分析研究
- Research of PS and LC link
- 液晶与显示 2017年32卷第7期页码：543-547
- 作者机构：
  
  合肥鑫晟光电科技有限公司, 安徽合肥 230012
- 作者简介：
  
  [ "苗丹丹 (1988-), 女, 安徽阜阳人, 硕士研究生, 高级研究员, 主要从事液晶显示面板的工艺研究及工艺类不良改善工作。" ]
- 基金信息：
- DOI：10.3788/YJYXS20173207.0543
  中图分类号： TN873.93
- 收稿日期：2017-01-22，
  
  录用日期：2017-2-27，
  
  纸质出版日期：2017-07-05
- 稿件说明：
移动端阅览
苗丹丹, 董安鑫, 谭聪, 等. 关于液晶联动的分析研究[J]. 液晶与显示, 2017,32(7):543-547.

Dan-dan MIAO, An-xin DONG, Cong TAN, et al. Research of PS and LC link[J]. Chinese journal of liquid crystals and displays, 2017, 32(7): 543-547.
苗丹丹, 董安鑫, 谭聪, 等. 关于液晶联动的分析研究[J]. 液晶与显示, 2017,32(7):543-547. DOI： 10.3788/YJYXS20173207.0543.

Dan-dan MIAO, An-xin DONG, Cong TAN, et al. Research of PS and LC link[J]. Chinese journal of liquid crystals and displays, 2017, 32(7): 543-547. DOI： 10.3788/YJYXS20173207.0543.

摘要

目前京东方部分产品量产时易出现重力Mura、低温气泡等问题，本文针对问题产生的原因进行分析，并对PS高度测试方法、PS高度与液晶量的联动方法进行分析研究及实验验证。目前测试PS高度的方法并未考虑工艺波动造成的色阻段差的变化对盒内体积的影响，本文首先提出了可以反映量产时色阻变化的PS高度测量方法，另根据LC Margin评价结果及PS形变量结果给出了PS高度与液晶量的联动关系。通过对PS高度与液晶量联动的分析研究，有效解决了因量产工艺波动造成的PS偏差引起的实际量产时滴下的液晶量并非对应的LC Margin中心的问题，从而避免出现重力Mura和低温气泡等LC Margin相关的问题，并且扩大了3%的工程管控范围，为企业的产品品质和竞争力的提升奠定了良好的基础。

Abstract

At present

some of the BOE products always had the problems of gravity Mura and cold气泡. In this paper

the causes of these problems were analyzed. Also

the method of PS height measurement

the interaction relation between PS height and the amount of liquid crystal were analyzed and experimentally verified. We found that the current method of PS height measurement didn't consider the influence of RGB process variation. In this paper

the influence of RGB process variation was considered in the new measurement method of PS height.At the same time

the linkage between PS height and LC amount was proposed based on the evaluation result of LC Margin and the PS deformation result. We solved the problem that the LC amount during the process of actual mass production was different from the center of appropriate LC Margin. In this way

the problems such as gravity Mura and cold bubble were avoided. Also

the margin of process control had been expanded 3%.

关键词

Keywords

references

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