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1. 香港科技大学 显示技术研究中心,香港
2. 广东中显科技有限公司,广东 佛山,528225
收稿日期:2013-04-15,
修回日期:2013-05-12,
纸质出版日期:2013-08-15
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郭海成, 周玮, 陈荣盛, 赵淑云, 张猛, 王文, 陈树明, 周南云. 搭桥晶粒多晶硅薄膜晶体管[J]. 液晶与显示, 2013,28(4): 471-478
KWOK Hoi-Sing, ZHOU Wei, CHEN Rong-sheng, ZHAO Shu-yun, ZHANG Meng, WONG Man, CHEN Shu-ming, CHOW Thomas. Bridged-Grain Polycrystalline Silicon Thin-Film Transistors[J]. , 2013,28(4): 471-478
郭海成, 周玮, 陈荣盛, 赵淑云, 张猛, 王文, 陈树明, 周南云. 搭桥晶粒多晶硅薄膜晶体管[J]. 液晶与显示, 2013,28(4): 471-478 DOI: 10.3788/YJYXS20132804.0471.
KWOK Hoi-Sing, ZHOU Wei, CHEN Rong-sheng, ZHAO Shu-yun, ZHANG Meng, WONG Man, CHEN Shu-ming, CHOW Thomas. Bridged-Grain Polycrystalline Silicon Thin-Film Transistors[J]. , 2013,28(4): 471-478 DOI: 10.3788/YJYXS20132804.0471.
提出了一种薄膜晶体管的新结构。这种新结构充分发挥了短沟道效应和多结效应的优点。通过器件模拟
验证了此种器件结构的物理机制。通过应用这种新结构
薄膜晶体管的阈值电压、伪亚阈值斜率、开关电流比和场效应迁移率都大幅改善
并且器件的热载流子和自加热可靠性也得到了极大的改善。
A new structure for thin-film transistors is proposed and demonstrated
exhibiting the benefits but not the drawbacks of both short-channel and multi-junction effects. Simulations are performed to verify the physics of this device structure. All characteristics such as threshold voltage
pseudo subthreshold slope
on-off current ratio and field-effect mobility are improved. Furthermore
device hot carrier and self-heating reliability are also improved by this new structure.
Meng Z, Chen H, Qiu C, et al. Application of metal-induced unilaterally crystallized polycrystalline silicon thin-film transistor technology to active-matrix organic light-emitting diode displays[C]//International Electron Devices Meeting, 2000. IEDM00. Technical Digest,2000:611-614.[2] Nomura K, Ohta H, Takagi A, et al. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors [J]. Nature,2004,432:488-492.[3] Masuda S, Kitamura K, Okumura Y, et al. Transparent thin film transistors using ZnO as an active channel layer and their electrical properties [J]. J. Appl. Phys., 2003, 93(3):1624-1630.[4] Morita Y, Noguchi M. UV pulsed laser annealing of Si+ implanted silicon film and low-temperature super-thin film transistors [J]. Japanese Journal of Applied Physics Part 2-Letters,1989, 28:L309-L311.[5] Hatalis M, Greve D. High-performance thin-film transistors in low-temperature crystallized Lpcvd amorphous-silicon films [J]. IEEE Electron Device Letters, 1987,8(8):361-364.[6] Zhao S Y, Meng Z G, Wu C Y, et al. Solution-based metal induced crystallized polycrystalline silicon films and thin-film transistors [J]. Journal of Materials Science-Materials in Electronics, 2007,18(1):117-121.[7] Im J, Crowder M, Sposili R, et al. Controlled super-lateral growth of Si films for microstructural manipulation and optimization [J]. Physica Status Solidi A-Applied Research, 1998, 166(2):603-617.[8] Lee S, Joo S. Low temperature poly-Si thin-film transistor fabrication by metal-induced lateral crystallization [J]. IEEE Electron Device Lett.,1996, 17(4):160-162.[9] Meng Z, Wang M, Wong M. High performance low temperature metal-induced unilaterally crystallized polycrystalline silicon thin film transistors for system-on-panel applications [J]. IEEE Transactions on Electron Devices, 2000,47(2):404-409.[10] Sohn W, Choi J, Kim K, et al.Crystalline orientation of polycrystalline silicon with disklike grains produced by silicide-mediated crystallization of amorphous silicon [J]. J. Appl. Phys., 2003,94(7):4326-4331.[11] Yabuta H, Sano M, Abe K, et al. High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering [J]. Appl. Phys. Lett., 2006,89(11):112123(1-3).[12] Hoffman R, Norris B, Wager J. ZnO-based transparent thin-film transistors [J]. Appl. Phys. Lett., 2003, 82(5):733-735.[13] Proano R, Misage R, AST D. Development and electrical-properties of undoped polycrystalline silicon thin-film transistors [J]. IEEE Transactions on Electron Devices, 1989,36(9):1915-1922.[14] Jeon J, Lee M, Park K, et al. A new polycrystalline silicon TFT with a single grain boundary in the channel [J]. IEEE Electron Device Lett., 2001,22(9):429-431.[15] Gaucci P, Valletta A, Mariucci L, et al. Role of field enhanced mechanisms and impact ionization on the threshold voltage of short channel polycrystalline silicon thin film transistors [J]. Appl. Phys. Lett., 2008, 93(19):193512.[16] Brotherton S, Glasse C, Glaister C, et al. High-speed, short-channel polycrystalline silicon thin-film transistors [J]. Appl. Phys. Lett.,2004, 84(2):293-295.[17] Valletta A, Gaucci P, Mariucci L, et al. Modelling velocity saturation and kink effects in p-channel polysilicon thin-film transistors [J]. Thin Solid Films,2007, 515(19):7417-7421.[18] LIU, LEE K. An experimental-study on the short-channel effects in undergated polysilicon thin-film transistors with and without lightly doped drain structures [J]. IEEE Electron Device Letters, 1993,14(3):149-151.[19] Noguchi T. Appearance of single-crystalline properties in fine-patterned Si thin-film transistors (TFTs) by solid-phase crystallization (SPC) [J]. Japan. J. Appl. Phys. Part 2-Letters, 1993, 32:L1584-L1587.[20] Chen T, Yeh C, Lou J. Effects of grain boundaries on performance and hot-carrier reliability of excimer-laser annealed polycrystalline silicon thin film transistors [J]. J. Appl. Phys., 2004, 95(10):5788-5794.
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