Influence of black photo spacer material for TFT-LCD on mark reading in exposure process

LI Ji; ZHANG Xia; LIAO Chang; HSIEH Chung-ching; YIN Yong-ming; MENG Hong

doi:10.37188/CJLCD.2023-0075

您当前的位置：

首页 >

文章列表页 >

Influence of black photo spacer material for TFT-LCD on mark reading in exposure process

Device Physics and Device Preparation | 更新时间：2023-08-10

- Influence of black photo spacer material for TFT-LCD on mark reading in exposure process
- Chinese Journal of Liquid Crystals and Displays Vol. 38, Issue 8, Pages: 1047-1053(2023)
- 作者机构：
  
  1.北京大学深圳研究生院，广东深圳 518055
  2.北京大学材料科学与工程学院，北京 100871
  3.深圳北理莫斯科大学，广东深圳 518172
  4.TCL华星光电技术有限公司，广东深圳 518132
- 作者简介：
- 基金信息：
  
  the National Natural Science Foundation of China(62205058);Guangdong Basic and Applied Basic Research Foundation(2021A1515110085);Shenzhen Science and Technology Program(JSGG20220831103402005)
- DOI：10.37188/CJLCD.2023-0075
  CLC：
扫描看全文
LI Ji, ZHANG Xia, LIAO Chang, et al. Influence of black photo spacer material for TFT-LCD on mark reading in exposure process. [J]. Chinese Journal of Liquid Crystals and Displays 38(8):1047-1053(2023)
DOI：

LI Ji, ZHANG Xia, LIAO Chang, et al. Influence of black photo spacer material for TFT-LCD on mark reading in exposure process. [J]. Chinese Journal of Liquid Crystals and Displays 38(8):1047-1053(2023) DOI： 10.37188/CJLCD.2023-0075.

摘要

大尺寸薄膜晶体管液晶显示器（Thin Film Transistor Liquid Crystal Display， TFT-LCD）显示器为节省黑色矩阵（Black Matrix， BM）制程降低面板成本，使用黑色膜柱（Black Photo Spacer， BPS）技术替代BM和PS（Photo Spacer）制程，同时为兼顾对组精度提升的需求，采用BOA（BPS on Array）技术，将BPS转移至阵列基板侧。原BM制程是第一道制作，而新的BPS制程则位于阵列最后一道制程。BPS曝光成型需使用阵列前制程的金属标（Metal Mark）进行精准对位，实现精细化图案。BPS的透过率低，致使CCD摄像机透过BPS抓取前制程的金属标进行对位非常困难。针对该技术难题，对曝光设备抓标的原理进行了分析，通过调整材料颜料组成，获取了不同透过率BPS材料。将不同透过率的BPS材料进行曝光成型，研究曝光对位过程对材料透过率的最低要求，同时遮光度尽可能大。实验结果表明，NSK曝光机对位灯源波长位于780~1 000 nm红外区域，在该波段BPS材料透过率低于23%时会导致对位失败。通过使用有机-无机混合颜料组成取代有机混合颜料，在红外波段可获得接近90%的透过率，满足对位需求。同时固化成型后可获得1.2/μm光学密度，满足BPS产品遮光特性需求。以此制作的BPS面板光学指标满足产品规格。

Abstract

For large size TFT-LCD displays， the black photo spacer （BPS） technology is adopted to replace the BM and PS （Photo Spacer） processes and shifted to the array substrate side in order to save the BM process and reduce panel costs. While the original BM process is the first production process， the new BPS process is located at the last process of the array. BPS exposure molding requires precise alignment using metal markers in the pre-array process to achieve fine patterns. Due to the low transmittance of BPS， it is very difficult to align the CCD by metal markers in the BPS pre-capture process. The principle of the exposure device to grasp the target is first analyzed， and then the BPS material with different transmittance is obtained by adjusting the composition of the BPS material. By exposure shaping of BPS materials with different transmittance， the minimum requirement of material transmittance during exposure alignment is studied to obtain the highest shading of BPS materials. The experimental results show that the wavelength of the NSK exposure machine alignment lamp source is located in the infrared region of 780~1 000 nm. When the transmittance of BPS material in this band is lower than 23%， the alignment fails. By using organic-inorganic mixed pigment components instead of organic black pigment components， nearly 90% transmittance can be obtained to meet the alignment requirements， and an optical density of 1.2/μm can be obtained after curing and molding to meet the shading needs of BPS products. The optical index of BPS board produced by this method is up to standard.

关键词

TFT-LCDBPS技术曝光工艺抓标对位透过率

Keywords

TFT-LCDBPS technologyexposure processmark readingtransmittance

references

CHEN H W， LEE J H， LIN B Y， et al. Liquid crystal display and organic light-emitting diode display： present status and future perspectives ［J］. Light： Science & Applications， 2018， 7（3）： 17168. doi: 10.1038/lsa.2017.168http://dx.doi.org/10.1038/lsa.2017.168

黄晓丽，孙玉宝，马红梅.液晶显示器多种显示模式色彩表现的研究进展［J］.液晶与显示，2021，36（3）：355-370． doi: 10.37188/CJLCD.2020-0231http://dx.doi.org/10.37188/CJLCD.2020-0231

HUANG X L， SUN Y B， MA H M. Research progress in color performance of LCD with various display modes ［J］. Chinese Journal of Liquid Crystals and Displays， 2021， 36（3）： 355-370. （in Chinese）. doi: 10.37188/CJLCD.2020-0231http://dx.doi.org/10.37188/CJLCD.2020-0231

吴显刚，季洪雷，钟海政.量子点液晶显示应用技术的进展与展望［J］.液晶与显示，2023，38（3）：276-290． doi: 10.37188/CJLCD.2022-0368http://dx.doi.org/10.37188/CJLCD.2022-0368

WU X G， JI H L， ZHONG H Z. Technical progress and prospects of QD-LCD display ［J］. Chinese Journal of Liquid Crystals and Displays， 2023， 38（3）： 276-290. （in Chinese）. doi: 10.37188/CJLCD.2022-0368http://dx.doi.org/10.37188/CJLCD.2022-0368

方庆，吴有肇，王峰，等.量子点液晶显示技术发展趋势与展望［J］.液晶与显示，2023，38（3）：267-275． doi: 10.37188/CJLCD.2022-0395http://dx.doi.org/10.37188/CJLCD.2022-0395

FANG Q， WU Y Z， WANG F， et al. Development trend and prospect of quantum dot liquid crystal display ［J］. Chinese Journal of Liquid Crystals and Displays， 2023， 38（3）： 267-275. （in Chinese）. doi: 10.37188/CJLCD.2022-0395http://dx.doi.org/10.37188/CJLCD.2022-0395

尹勇明，孟鸿.量子点、钙钛矿色转换全彩显示应用研究进展［J］.发光学报，2021，42（4）：419-447． doi: 10.37188/CJL.20200391http://dx.doi.org/10.37188/CJL.20200391

YIN Y M， MENG H. Progress of quantum dots and perovskite as color conversion materials for full-color display［J］. Chinese Journal of Luminescence， 2021， 42（4）： 419-447. （in Chinese）. doi: 10.37188/CJL.20200391http://dx.doi.org/10.37188/CJL.20200391

彭寿，洪伟，秦旭升，等.我国信息显示关键材料发展战略研究［J］.中国工程科学，2022，24（4）：85-93． doi: 10.15302/j-sscae-2022.04.009http://dx.doi.org/10.15302/j-sscae-2022.04.009

PENG S， HONG W， QIN X S， et al. Development strategy of key materials for information display in China［J］. Strategic Study of CAE， 2022， 24（4）： 85-93. （in Chinese）. doi: 10.15302/j-sscae-2022.04.009http://dx.doi.org/10.15302/j-sscae-2022.04.009

吴怡然，孙勉，曹可慰，等.液晶显示材料标准化发展建议［J］.液晶与显示，2023，38（2）：181-187． doi: 10.37188/cjlcd.2022-0298http://dx.doi.org/10.37188/cjlcd.2022-0298

WU Y R， SUN M， CAO K W， et al. Suggestions on the development of standardization of liquid crystal display materials ［J］. Chinese Journal of Liquid Crystals and Displays， 2023， 38（2）： 181-187. （in Chinese）. doi: 10.37188/cjlcd.2022-0298http://dx.doi.org/10.37188/cjlcd.2022-0298

姜明宵，胡伟频，王纯，等.液晶显示的竞争前景以及液晶材料的未来应用［J］.光电子技术，2021，41（2）：94-98，109． doi: 10.19453/j.cnki.1005-488x.2021.02.003http://dx.doi.org/10.19453/j.cnki.1005-488x.2021.02.003

JIANG M X， HU W P， WANG C， et al. The competitive prospect of liquid crystal display and the future application of liquid crystal materials ［J］. Optoelectronic Technology， 2021， 41（2）： 94-98， 109. （in Chinese）. doi: 10.19453/j.cnki.1005-488x.2021.02.003http://dx.doi.org/10.19453/j.cnki.1005-488x.2021.02.003

曾娅，魏雄周，万彬，等.全染料系光刻胶在液晶显示器中的应用［J］.液晶与显示，2020，35（9）：933-937． doi: 10.37188/YJYXS20203509.0933http://dx.doi.org/10.37188/YJYXS20203509.0933

ZENG Y， WEI X Z， WAN B， et al. Application of all dye blue photoresist in liquid crystal display ［J］. Chinese Journal of Liquid Crystals and Displays， 2020， 35（9）： 933-937. （in Chinese）. doi: 10.37188/YJYXS20203509.0933http://dx.doi.org/10.37188/YJYXS20203509.0933

查宝，唐敏，李吉，等.有机纳米颜料对彩膜滤光片的对比度影响［J］.液晶与显示，2020，35（1）：26-30． doi: 10.3788/yjyxs20203501.0026http://dx.doi.org/10.3788/yjyxs20203501.0026

ZHA B， TANG M， LI J， et al. Effect of organic nano-pigments on contrast ratio of color filters ［J］. Chinese Journal of Liquid Crystals and Displays， 2020， 35（1）： 26-30. （in Chinese）. doi: 10.3788/yjyxs20203501.0026http://dx.doi.org/10.3788/yjyxs20203501.0026

任玉鑫，徐润峰，王婉颖，等.彩色光刻胶用蒽醌染料的合成及稳定性研究［J］.化工学报，2022，73（5）：2251-2261． doi: 10.11949/0438-1157.20211726http://dx.doi.org/10.11949/0438-1157.20211726

REN Y X， XU R F， WANG W Y， et al. Synthesis and stability study of anthraquinone dyes for color photoresist ［J］. CIESC Journal， 2022， 73（5）： 2251-2261. （in Chinese）. doi: 10.11949/0438-1157.20211726http://dx.doi.org/10.11949/0438-1157.20211726

XU R F， REN Y X， WANG W Y， et al. Design， synthesis and properties of zinc phthalocyanine dyes for color photoresist ［J］. Scientia Sinica Chimica， 2022， 52（8）： 1393-1399. doi: 10.1360/ssc-2022-0053http://dx.doi.org/10.1360/ssc-2022-0053

张萍萍，杨高岭，康果果，等.量子点光刻技术及其显示应用［J］.应用化学，2021，38（9）：1175-1188． doi: 10.19894/j.issn.1000-0518.210156http://dx.doi.org/10.19894/j.issn.1000-0518.210156

ZHANG P P， YANG G L， KANG G G， et al. Photolithography of colloidal quantum dots for display applications ［J］. Chinese Journal of Applied Chemistry， 2021， 38（9）： 1175-1188. （in Chinese）. doi: 10.19894/j.issn.1000-0518.210156http://dx.doi.org/10.19894/j.issn.1000-0518.210156

郭海泉，杨正华，高连勋.光敏聚酰亚胺光刻胶研究进展［J］.应用化学，2021，38（9）：1119-1137． doi: 10.19894/j.issn.1000-0518.210274http://dx.doi.org/10.19894/j.issn.1000-0518.210274

GUO H Q， YANG Z H， GAO L X. Progress research on photosensitive polyimide ［J］. Chinese Journal of Applied Chemistry， 2021， 38（9）： 1119-1137. （in Chinese）. doi: 10.19894/j.issn.1000-0518.210274http://dx.doi.org/10.19894/j.issn.1000-0518.210274

朋小康，黄兴文，刘荣涛，等.光刻胶成膜剂：发展与未来［J］.应用化学，2021，38（9）：1079-1090． doi: 10.19894/j.issn.1000-0518.210152http://dx.doi.org/10.19894/j.issn.1000-0518.210152

PENG X K， HUANG X W， LIU R T， et al. Photoresist film-forming agent： development and future ［J］. Chinese Journal of Applied Chemistry， 2021， 38（9）： 1079-1090. （in Chinese）. doi: 10.19894/j.issn.1000-0518.210152http://dx.doi.org/10.19894/j.issn.1000-0518.210152

SABNIS R W. Color filter technology for liquid crystal displays ［J］. Displays， 1999， 20（3）： 119-129. doi: 10.1016/s0141-9382(99)00013-xhttp://dx.doi.org/10.1016/s0141-9382(99)00013-x

NAMGOONG J W， KIM H M， KIM S H， et al. Synthesis and characterization of metal phthalocyanine bearing carboxylic acid anchoring groups for nanoparticle dispersion and their application to color filters ［J］. Dyes and Pigments， 2021， 184： 108737. doi: 10.1016/j.dyepig.2020.108737http://dx.doi.org/10.1016/j.dyepig.2020.108737

SUGITA H， KANAI D， MASHIMA H， et al. Poly（vinyl alcohol）-based photosensitive water-borne coating for low-temperature color-filter production ［J］. Displays， 2021， 69： 102057. doi: 10.1016/j.displa.2021.102057http://dx.doi.org/10.1016/j.displa.2021.102057

SUGITA H， EBATA S， SUZUKI H， et al. Polyvinyl-alcohol-based color resist for low-temperature color-filter production ［J］. Displays， 2023， 77： 102393. doi: 10.1016/j.displa.2023.102393http://dx.doi.org/10.1016/j.displa.2023.102393

Views

130

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

Effect of capacitance on common voltage in TFT-LCD

Mura defect detection based on effective background reconstruction and contrast enhancement

Quantitative study on the mechanism of high temperature vertical crosstalks

Mechanism analysis and improvement of TFT-LCD green Mura

Related Author

No data

Related Institution

TCL China Star Optoelectronics Technology Co.， Ltd

Peking University ShenZhen Graduate School

Fuzhou BOE Optoelectronics Technology Co., Ltd.

Sino-German College of Intelligent Manufacturing, Shenzhen Technology University

Key Laboratory of Advanced Optical Precision Manufacturing Technology of Guangdong Provincial Higher Education Institute

Address：No.3888 Dong Nanhu Road, Changchun, Jilin, China 130033 Postal code：130033
Tel：0431-86176059 Email：yjxs@ciomp.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 吉ICP备11002662号-17 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.

⁰