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重庆京东方光电科技有限公司 重庆 400714
[ "熊奇(1987-), 男, 湖北十堰人, 2014年于太原理工大学获得硕士学位, 主要从事液晶显示面板产品良率提升、不良解析及改善等方面的研究。E-mail:xiongqi@boe.com.cn" ]
收稿日期:2019-10-16,
修回日期:2019-12-13,
录用日期:2019-12-13,
纸质出版日期:2020-05-05
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熊奇, 许志军, 杨宗顺, 等. 基于彩色滤光片柱状隔垫物高度的液晶滴下工艺[J]. 液晶与显示, 2020,35(5):437-443.
Qi XIONG, Zhi-jun XU, Zong-shun YANG, et al. LC drop process based on PS height of color filter[J]. Chinese journal of liquid crystals and displays, 2020, 35(5): 437-443.
熊奇, 许志军, 杨宗顺, 等. 基于彩色滤光片柱状隔垫物高度的液晶滴下工艺[J]. 液晶与显示, 2020,35(5):437-443. DOI: 10.3788/YJYXS20203505.0437.
Qi XIONG, Zhi-jun XU, Zong-shun YANG, et al. LC drop process based on PS height of color filter[J]. Chinese journal of liquid crystals and displays, 2020, 35(5): 437-443. DOI: 10.3788/YJYXS20203505.0437.
液晶滴下工艺是TFT-LCD生产中的关键技术。液晶的滴下量一般选取在不发生低温气泡和高温重力Mura的范围内,这被称为LC Margin。LC Margin越窄,液晶滴下的中心量距离上下限的范围越小,生产过程中随工艺波动容易出现低温气泡和重力Mura不良。本文针对LC Margin窄的产品(≤ 3%)提出了根据彩色滤光片柱状隔垫物的高度进行整批次分液晶面板进行液晶滴下的方法。生产过程中对该方法产出的液晶面板进行高低温测试,结果显示没有重力Mura及低温气泡出现,优化了液晶滴下工艺,为LC Margin窄的产品在生产中应用提供了一种新的解决方案。
Liquid crystal drop process is the key to the TFT -LCD technology. Generally
the selection of liquid crystal drop amount of products refer to the range of liquid crystal without cold bubble and gravity Mura
that is
LC Margin. The narrower the margin is
the smaller the range of upper and lower limits of the liquid crystal center distance of the product
and the cold bubble and gravity Mura are liable to occur during the process fluctuation. In this paper
a method of liquid crystal drop by panel is proposed according to the PS height of color filter for products with narrow LC Margin (≤ 3%). There is no cold bubble and gravity Mura in the test of high and low temperature during the production process with this method
at the same time
the liquid crystal dropping process was optimized. It provides a new solution for products with narrow LC Margin.
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王 绍华 , 吴 飞 , 宣 津 , 等 . ODF工艺中液晶滴下与边框胶穿刺关系研究 . 科技创新与应用 , 2018 . 4 74 - 77 . DOI: 10.3969/j.issn.2095-2945.2018.29.033 http://doi.org/10.3969/j.issn.2095-2945.2018.29.033 .
S H WANG , F WU , J XUAN , 等 . Study on the relationship between LC drop and border glue puncture in ODF process . Technology Innovation and Application , 2018 . 4 74 - 7 . DOI: 10.3969/j.issn.2095-2945.2018.29.033 http://doi.org/10.3969/j.issn.2095-2945.2018.29.033 .
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