氮化硅膜层对TFT白点色度均匀性的影响及其改善

操彬彬; 叶成枝; 安晖; 马力; 刘广东; 吕艳明; 彭俊林; 杨增乾; 栗芳芳; 陆相晚; 黄正峰; 刘增利; 廖伟经; 李恒滨

doi:10.3788/YJYXS20193412.1166

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氮化硅膜层对TFT白点色度均匀性的影响及其改善

材料与器件 | 更新时间：2020-07-16

- 氮化硅膜层对TFT白点色度均匀性的影响及其改善
- Research and improvement of TFT white color uniformity based on SiN_x film
- 液晶与显示 2019年34卷第12期页码：1166-1171
- 作者机构：
  
  合肥鑫晟光电科技有限公司, 安徽合肥 230001
- 作者简介：
  
  [ "操彬彬(1987—), 男, 安徽安庆人, 硕士, 2011年于北京化工大学获得硕士学位, 主要从事液晶显示器TFT工艺相关的技术研发工作。E-mail:caobinbin@boe.com.cn" ]
- 基金信息：
- DOI：10.3788/YJYXS20193412.1166
  中图分类号： O439
- 收稿日期：2019-05-30，
  
  录用日期：2019-9-27，
  
  纸质出版日期：2019-12-05
- 稿件说明：
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操彬彬, 叶成枝, 安晖, 等. 氮化硅膜层对TFT白点色度均匀性的影响及其改善[J]. 液晶与显示, 2019,34(12):1166-1171.

Bin-bin CAO, Cheng-zhi YE, Hui AN, et al. Research and improvement of TFT white color uniformity based on SiN_x film[J]. Chinese journal of liquid crystals and displays, 2019, 34(12): 1166-1171.
操彬彬, 叶成枝, 安晖, 等. 氮化硅膜层对TFT白点色度均匀性的影响及其改善[J]. 液晶与显示, 2019,34(12):1166-1171. DOI： 10.3788/YJYXS20193412.1166.

Bin-bin CAO, Cheng-zhi YE, Hui AN, et al. Research and improvement of TFT white color uniformity based on SiN_x film[J]. Chinese journal of liquid crystals and displays, 2019, 34(12): 1166-1171. DOI： 10.3788/YJYXS20193412.1166.

摘要

基于相同点位分别测试了TFT白点色度均匀性（WCU）和各层氮化硅（SiN

）膜厚，并分析了二者的关联性，发现TFT WCU与栅极绝缘层（GI）和第二绝缘层（PVX2）两层的相关性较大，而与厚度最薄，折射率最大的第一绝缘层（PVX1）最不相关；提出了降低GI层剩余厚度避免低速沉积GI（GL）的残留和降低PVX2膜层厚度以提升面内均一性的改善方案，最终使得产品的TFT WCU均值降低约0.000 7；最大值由改善前的0.007 0降至改善后的0.005 2，满足了最大值≤ 0.005 5的目标值，改善效果明显。

Abstract

TFT White Color Uniformity (WCU) and SiN

film thickness of each layer were tested based on the same test points and the correlation between them is analyzed. It is found that TFT WCU has a great correlation with GI and PVX2 layers rather than PVX1 layer with the thinnest THK and largest

value. On this basis

an improvement scheme to reduce the center value of GI Remain THK(to avoid the residue of GL layer) and PVX2 THK (to improve the uniformity in panel)at the same time is proposed

which can reduces the mean value of TFT WCU by about 0.000 7. After improvement

the maximum value can be decreased from 0.007 0 to 0.005 2 to satisfy the specification(maximum value ≤ 0.005 5). The effect of improvement is obvious.

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