PS光阻顶部凹陷问题研究

张宇; 陈珍霞; 侯伟康; 陈黎暄

doi:10.3788/YJYXS20193410.0977

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PS光阻顶部凹陷问题研究

材料与器件 | 更新时间：2020-08-12

- PS光阻顶部凹陷问题研究
- Study on the top concave of PS photoresistor
- 液晶与显示 2019年34卷第10期页码：977-981
- 作者机构：
  
  深圳市华星光电技术有限公司, 广东深圳 518132
- 作者简介：
  
  [ "张宇(1988—), 男, 安徽芜湖人, 硕士研究生, 2010年于东南大学获得学士学位, 现就读于北京大学深圳研究生院信息工程学院, 主要从事平板显示生产制造工作。E-mail:zh_yu@tcl.com" ]
  [ "陈珍霞(1985—), 女, 福建连城人, 高级工程师, 2010年于武汉理工大学获得硕士学位, 主要从事光阻材料曝光显影特性和模拟及平板显示中新材料新技术的开发工作。E-mail:chenzhenxia@tcl.com" ]
- 基金信息：
- DOI：10.3788/YJYXS20193410.0977
  中图分类号： TN27
- 收稿日期：2019-04-19，
  
  录用日期：2019-6-30，
  
  纸质出版日期：2019-10-05
- 稿件说明：
移动端阅览
张宇, 陈珍霞, 侯伟康, 等. PS光阻顶部凹陷问题研究[J]. 液晶与显示, 2019,34(10):977-981.

Yu ZHANG, Zhen-xia CHEN, Wei-kang HOU, et al. Study on the top concave of PS photoresistor[J]. Chinese journal of liquid crystals and displays, 2019, 34(10): 977-981.
张宇, 陈珍霞, 侯伟康, 等. PS光阻顶部凹陷问题研究[J]. 液晶与显示, 2019,34(10):977-981. DOI： 10.3788/YJYXS20193410.0977.

Yu ZHANG, Zhen-xia CHEN, Wei-kang HOU, et al. Study on the top concave of PS photoresistor[J]. Chinese journal of liquid crystals and displays, 2019, 34(10): 977-981. DOI： 10.3788/YJYXS20193410.0977.

摘要

随着对液晶显示器高分辨率的需求不断增长，像素设计的尺寸越来越小，分布在像素上方起支撑作用的柱状隔离子（Photo Spacer）尺寸也不断减小。柱状隔离子的顶部面积与底部面积的比值变大，提高了耐压能力，但对制程中柱状隔离子图案化的形状控制能力提出了更高的要求。在目前的材料和制程条件下，精细化的形状存在一些工艺问题，其中最典型的是顶部凹陷问题。基于以上问题，对PS凹陷进行研究；引进半导体行业中应用广泛的曝光显影模拟软件进行曝光光型分布模拟及理论分析，提出降低曝光间隙进行改善，经实验验证凹陷得到改善。实验结果表明，减小曝光间隙，由250

m降低到150

m，可以有效改善PS顶部凹陷的问题。通过减小曝光间隙，可以改变曝光光束，即高斯光束的空间分布，从而改变PS光阻受光分布，进而改变PS最终形状，即改善PS顶部凹陷问题；且高斯光束的空间分布，可通过曝光显影模拟得到，可见曝光显影模拟可分析和预估实验结果，且为问题改善提出可行的意见。

Abstract

The LCD is mainly composed of two substrates and the liquid crystal in the middle. Among them

photo spacer is an important part which is placed on th bottom substrate and sustains the upper substrate. As the trend of higher and higher resolution of the display

there is a need for accurate controlling of morphology of the photo spacer in mass process. In this paper

we pay attention to one of the most common issue of very small size photo spacer that the top of it suffers concave surface which influences the supporting capacity of the photo spacer. In order to improve the problem of concave

this paper proposes to reduce the exposure gap through optical simulation and theoretical analysis

which has been verified by experiments. The results show that the spatial distribution of the Gauss beam can be changed by reducing the exposure gap

and the problem of PS top depression can be improved. Exposure pattern distribution simulation and theoretical analysis were carried out by using exposure development simulation software. It was proposed that the exposure gap should be reduced

and the experiment verified that the depression could be improved. The experimental results show that reducing the exposure gap from 250

m to 150

m can effectively improve the problem of PS top depression. By reducing the exposure gap

the spatial distribution of the exposure beam

i.e. the Gauss beam

can be changed

thus the distribution of the photoresist of PS can be changed

and the final shape of PS can be changed

i.e. the problem of depression at the top of PS can be improved; and the spatial distribution of the Gauss beam can be obtained by the simulation of exposure development. The simulation of exposure development can analyze and predict the experimental results

and provide feasible suggestions for the improvement of the problem.

关键词

Keywords

references

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