椭偏高斯光束经过非线性介质后的远场衍射图样

陶智; 彭楚楚; 邓罗根

doi:10.3788/YJYXS20193405.0451

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椭偏高斯光束经过非线性介质后的远场衍射图样

材料与器件 | 更新时间：2020-07-05

- 椭偏高斯光束经过非线性介质后的远场衍射图样
- Far field diffraction patterns of elliptically polarized Gauss beam passing through the nonlinear media
- 液晶与显示 2019年34卷第5期页码：451-458
- 作者机构：
  
  北京理工大学物理学院, 北京 100081
- 作者简介：
  
  [ "陶智(1993-), 女, 山西朔州人, 硕士研究生, 2016年于忻州师范学院获得学士学位, 主要从事非线性光学方面的研究。E-mail:1042517312@qq.com" ]
  [ "邓罗根(1961-), 男, 江苏东台人, 教授, 博士生导师, 1989年于清华大学获得博士学位, 1990~1992年在北京理工大学光学系做博士后研究, 1999年、2009年先后在美国加州大学洛杉矶分校(UCLA)和加拿大多伦多大学作访问学者, 主要从事激光物理、液晶光子学和非线性光学等的研究。E-mail:luogen@bit.edu.cn" ]
- 基金信息：
  
  国家自然科学基金(11474021);National Natural Science Foundation of China(11474021)
- DOI：10.3788/YJYXS20193405.0451
  中图分类号： O437
- 收稿日期：2018-12-30，
  
  录用日期：2019-2-20，
  
  纸质出版日期：2019-05
- 稿件说明：
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陶智, 彭楚楚, 邓罗根. 椭偏高斯光束经过非线性介质后的远场衍射图样[J]. 液晶与显示, 2019,34(5):451-458.

Zhi TAO, Chu-chu PENG, Luo-gen DENG. Far field diffraction patterns of elliptically polarized Gauss beam passing through the nonlinear media[J]. Chinese journal of liquid crystals and displays, 2019, 34(5): 451-458.
陶智, 彭楚楚, 邓罗根. 椭偏高斯光束经过非线性介质后的远场衍射图样[J]. 液晶与显示, 2019,34(5):451-458. DOI： 10.3788/YJYXS20193405.0451.

Zhi TAO, Chu-chu PENG, Luo-gen DENG. Far field diffraction patterns of elliptically polarized Gauss beam passing through the nonlinear media[J]. Chinese journal of liquid crystals and displays, 2019, 34(5): 451-458. DOI： 10.3788/YJYXS20193405.0451.

摘要

以衍射理论为基础，建立了椭偏高斯光束通过非线性介质后远场光强分布的理论模型。利用该理论模型采用数值模拟的方法研究了椭偏高斯光束与非线性介质相互作用后在远场形成的衍射图样随椭偏光椭偏率变化的演化规律。分析发现，在不同非线性机制下，椭偏率的变化对远场衍射图样的影响明显不同。在分子取向机制下，非线性介质对入射椭偏高斯光束椭偏率变化的响应最敏感，不仅影响衍射图样的分布尺寸和衍射环的数目，而且还影响远场衍射图样中央光斑的亮暗。由于线偏振和圆偏振是椭圆偏振的特殊情况，本文所建立的模型也适用于入射光束偏振态为线偏振或圆偏振态的情况。

Abstract

Based on the diffraction theory

a theoretical model of far-field intensity distribution of elliptically polarized Gaussian beam passing through the nonlinear medium was established. Using this theoretical model

the effect of the ellipticity of elliptically polarized Gaussian beam on the evolution of the far-field pattern was studied. The results show that the influence of the ellipticity on far-field diffraction patterns is different for different nonlinear mechanisms. For the molecular reorientation mechanism

the influence of the change of the ellipticity on the far-field pattern is the biggest

which will not only change the diameter of the pattern and the number of diffraction rings

but also change the spot of the pattern from dark to bright (or from bright to dark). In addition

the theoretical model is also applicable to the cases where the polarization state of the incident Gaussian beam is linearly polarized or circularly polarized.

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