薄型化背光源顶白形成机理探讨及改善

唐胜果; 董春垒; 刘子源; 徐海丰; 项海霞; 张正元; 随鹏; 马勇; 赵曼

doi:10.3788/YJYXS20183310.0836

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薄型化背光源顶白形成机理探讨及改善

材料与器件 | 更新时间：2020-07-06

- 薄型化背光源顶白形成机理探讨及改善
- Mechanism and improvement of extruded white spot in thin and slim BLU
- 液晶与显示 2018年33卷第10期页码：836-843
- 作者机构：
  
  合肥鑫晟光电科技有限公司, 安徽合肥 230012
- 作者简介：
  
  [ "唐胜果(1985-), 男, 湖南益阳人, 硕士, 高级工程师, 2012年于湖南大学获得硕士学位, 主要从事BLU产品设计及品质管理。E-mail:tangshengguo@boe.com.cn" ]
- 基金信息：
- DOI：10.3788/YJYXS20183310.0836
  中图分类号： TN942.1
- 收稿日期：2018-06-25，
  
  录用日期：2018-7-5，
  
  纸质出版日期：2018-10-05
- 稿件说明：
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唐胜果, 董春垒, 刘子源, 等. 薄型化背光源顶白形成机理探讨及改善[J]. 液晶与显示, 2018,33(10):836-843.

Sheng-guo TANG, Chun-lei DONG, Zi-yuan LIU, et al. Mechanism and improvement of extruded white spot in thin and slim BLU[J]. Chinese journal of liquid crystals and displays, 2018, 33(10): 836-843.
唐胜果, 董春垒, 刘子源, 等. 薄型化背光源顶白形成机理探讨及改善[J]. 液晶与显示, 2018,33(10):836-843. DOI： 10.3788/YJYXS20183310.0836.

Sheng-guo TANG, Chun-lei DONG, Zi-yuan LIU, et al. Mechanism and improvement of extruded white spot in thin and slim BLU[J]. Chinese journal of liquid crystals and displays, 2018, 33(10): 836-843. DOI： 10.3788/YJYXS20183310.0836.

摘要

介绍了背光源顶白不良，探讨了顶白的形成机理。研究发现表面光滑反射片对导光板网点间留白区域的挤压是产生顶白的根本原因。由此提出通过改善背板局部凸起高度和增加反射片粗糙度来改善顶白。结果表明：顶白发生率随背板局部凸起高度降低和反射片表面粗糙度增加而明显降低。控制模具凸棱厚度可调整回压量，进而降低背板局部凸起高度。模具凸棱厚度为0.05 mm时，背板局部凸起高度均值由无回压时的0.21 mm降低至0.11 mm，加速试验条件下对应顶白发生率由50%降低至18.7%；涂布不同大小粒子可调整反射片表面粗糙度。当反射片涂布Bead粒子径为40 μm，对应粗糙度为6.29 μm时，并搭配段差回压后背板，改善后背光源在加速试验条件下无顶白发生。同时，经光学、老化及振动测试，改善后背光源未发现其它相关不良。

Abstract

This paper reports the extruded white spot (EWS) of BLU and the associated caused reasons

and studies the impaction of the height of local convexity on back cover and the roughness of reflector film on EWS. The results show that the incidence of EWS significantly reduces with the decrease in the height of local convexity. Under the best back-pressure process

the mean value of local convexity decline from 0.21 mm to 0.11mm. Accordingly

the incidence of EWS declines from 50% to 18.7% during THO & VIB accelerated tests. The anti-EWS ability of reflector film is obviously improved with the increase in roughness. There is no EWS occurred

when the roughness is 6.29 μm together with using back-pressure back cover.

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references

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