PCI结构TFT-LCD产品竖Mura不良机理分析及改善研究

郭志轩; 田亮; 方业周; 王凤国; 李凯; 张绪; 李峰; 武新国

doi:10.3788/YJYXS20183305.0397

您当前的位置：

首页 >

文章列表页 >

PCI结构TFT-LCD产品竖Mura不良机理分析及改善研究

材料与器件 | 更新时间：2020-08-12

- PCI结构TFT-LCD产品竖Mura不良机理分析及改善研究
- Research and improvement of vertical Mura on TFT-LCD with double notched PCI structure
- 液晶与显示 2018年33卷第5期页码：397-404
- 作者机构：
  
  鄂尔多斯源盛光电有限责任公司, 内蒙古鄂尔多斯 017000
- 作者简介：
  
  [ "郭志轩(1992-), 男, 内蒙古包头人, 中级研究员, 主要从事液晶显示面板的生产和工艺相关工作。E-mail:guozhixuan@boe.com.cn" ]
- 基金信息：
- DOI：10.3788/YJYXS20183305.0397
  中图分类号： TN141.9
- 收稿日期：2017-12-26，
  
  录用日期：2018-1-22，
  
  纸质出版日期：2018-05
- 稿件说明：
移动端阅览
郭志轩, 田亮, 方业周, 等. PCI结构TFT-LCD产品竖Mura不良机理分析及改善研究[J]. 液晶与显示, 2018,33(5):397-404.

Zhi-xuan GUO, Liang TIAN, Ye-ZHou FANG, et al. Research and improvement of vertical Mura on TFT-LCD with double notched PCI structure[J]. Chinese journal of liquid crystals and displays, 2018, 33(5): 397-404.
郭志轩, 田亮, 方业周, 等. PCI结构TFT-LCD产品竖Mura不良机理分析及改善研究[J]. 液晶与显示, 2018,33(5):397-404. DOI： 10.3788/YJYXS20183305.0397.

Zhi-xuan GUO, Liang TIAN, Ye-ZHou FANG, et al. Research and improvement of vertical Mura on TFT-LCD with double notched PCI structure[J]. Chinese journal of liquid crystals and displays, 2018, 33(5): 397-404. DOI： 10.3788/YJYXS20183305.0397.

摘要

针对像素电极与公共电极换位（P-ITO and C-ITO Interchanged，PCI）结构薄膜晶体管液晶显示器（Thin Film Transistor-Liquid Crystal Display，TFT-LCD）产品中出现的一种竖Mura，结合生产工艺的实际情况，本文运用关键尺寸（Critical Dimension，CD）、EPM（Electrical Properties Measurement）、SEM（Scanning Electron Microscope，扫描电子显微镜）等检测设备，进行了大量的实验测试、数据处理和理论分析工作。通过测量Cell Gap、膜厚、CD、Overlay等特性参数，进行产品设计对比、光效模拟和Lens恶化实验，发现该不良与PCI结构的特殊性有关。其产生的根本原因是不良区域内两层ITO之间左右非交叠区域CD差异造成电场分布异常导致液晶偏转角度异常，最终导致屏幕亮暗不均。通过改变ITO对位方式提高两层ITO之间左右非交叠区域的均一性，有效地降低了不良的发生率（从26%下降到0.1%以内）。

Abstract

Aiming at a vertical Mura occurred in the TFT-LCD (Thin Film Transistor-Liquid Crystal Display) products with PCI (P-ITO and C-ITO Interchanged) structure

this paper did amount of work

combined with the actual situation of productive technology and through CD (Critical Dimension)

EPM (Electrical Properties Measurement) and SEM (Scanning Electron Microscope) equipment

such as experiments testing

data processing and theoretical analysis. By measuring characteristic parameters (Cell Gap

Film thickness

Critical Dimension and Overlay)

comparing the product design

lighting simulation and Lens deterioration

it has been found that the vertical Mura is closely related to the special properties of PCI structure. It also has been found that the occurrence of the NG is mainly due to the gap between the CD value of ITO's left and right no-overlapping area in NG panel

which made the electric field distribute abnormally and the liquid crystal deflect unusually

finally gave rise to the uneven brightness. By changing the ITO contrapuntal method to improve the homogeneity of the ITO's left and right no-overlapping area

we can effectively reduce the ratio of the Mura from 26% to less than 0.1%.

关键词

Keywords

references

田民波, 叶锋.TFT液晶显示原理与技术[M].北京:科学出版社, 2010:5-40.

TIAN M B, YE F. TFT LCD Display Principle and Technology [M].Beijing:Science Press, 2010:5-40.(in Chinese)

沙双庆.薄膜晶体管液晶显示器的发展分析[J].江苏科技信息, 2017, 26:37-38.

SHA S Q.Development Analysis of TFT LCD Dsiplay[J]. Jiangsu Science and Technology Information , 2017, 26:37-38.(in Chinese)

毕昕, 丁汉. TFT-LCD Mura缺陷机器视觉检测方法[J].机械工程学报, 2010, 46(12):13-19.

BI X, DING H.Machine Vision inspection method of Mura defect for TFT-LCD[J]. Journal of Mechanical Engineering , 2010, 46(12):13-19.

王风华. TFT-LCD制造过程中周边Mura的消除[D]. 苏州大学, 2014. http://cdmd.cnki.com.cn/Article/CDMD-10285-1015538837.htm

WANG F H. Edge Mura Elimination in TFT-LCD Manufacture Process[D]. Suzhou University, 2014.

马群刚.TFT-LCD原理与设计[M].北京:电子工业出版社, 2011:45-47.

MA A G. Principle and Design of TFT-LCD [M].Beijing:Publishing House of Electronics Industry, 2011:45-47.(in Chinese)

吴洪江, 王威, 龙春平.一种TFT-LCD Vertical Block Mura的研究与改善[J].液晶与显示, 2007, 22(4):433-439.

WU H J, WANG W, LONG C P.Research and Improvement about Vertical Block Mura in TFT-LCD Process[J]. Chinese Journal of Liquid Crystals and Displays , 2007, 22(4):433-439.(in Chinese)

石天雷, 杨国波, 程石, 等. Zara漏光和Rubbing Mura改善研究[J].液晶与显示, 2012, 27(2):208-211.

SHI T L, YANG G B, CHENG S, et al. Zara and Rubbing Mura research[J]. Chinese Journal of Liquid Crystals and Displays , 2012, 27(2):208-211.(in Chinese)

浏览量

下载量

CSCD

文章被引用时，请邮件提醒。

提交

工具集

关联资源

钙钛矿量子点玻璃背光应用

非矩形像素金属网格触控屏上莫尔纹的仿真和分析

共面转换液晶显示器中降低离轴漏光的光学补偿方法

液晶显示器多种显示模式色彩表现的研究进展

背光模组复合光学膜片的应用