PS-VA模式中RM残留量对信赖性的影响

贵丽红; 池宝林; 赵国; 高红茹; 温刚; 李正强; 舒克伦; 梁瑞祥

doi:10.3788/YJYXS20173210.0799

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PS-VA模式中RM残留量对信赖性的影响

材料科学 | 更新时间：2020-08-12

- PS-VA模式中RM残留量对信赖性的影响
- Impact on image sticking of residual reactive mesogen in PS-VA mode
- 液晶与显示 2017年32卷第10期页码：799-803
- 作者机构：
  
  1.河北省平板显示材料工程技术研究中心/石家庄诚志永华显示材料有限公司, 河北石家庄 050091
  2.深圳华星光电技术有限公司, 广东深圳 518132
- 作者简介：
  
  [ "GUI Li-hong(1981-), female, Lincheng Hebei, master, engineer, engaged in the research and development of LC materials, E-mail: glh@slichem.com" ]
- 基金信息：
- DOI：10.3788/YJYXS20173210.0799
  中图分类号： TN141.9
- 收稿日期：2017-05-24，
  
  录用日期：2017-6-11，
  
  纸质出版日期：2017-10-05
- 稿件说明：
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贵丽红, 池宝林, 赵国, 等. PS-VA模式中RM残留量对信赖性的影响[J]. 液晶与显示, 2017,32(10):799-803.

Li-hong GUI, Bao-lin CHI, Guo ZHAO, et al. Impact on image sticking of residual reactive mesogen in PS-VA mode[J]. Chinese journal of liquid crystals and displays, 2017, 32(10): 799-803.
贵丽红, 池宝林, 赵国, 等. PS-VA模式中RM残留量对信赖性的影响[J]. 液晶与显示, 2017,32(10):799-803. DOI： 10.3788/YJYXS20173210.0799.

Li-hong GUI, Bao-lin CHI, Guo ZHAO, et al. Impact on image sticking of residual reactive mesogen in PS-VA mode[J]. Chinese journal of liquid crystals and displays, 2017, 32(10): 799-803. DOI： 10.3788/YJYXS20173210.0799.

摘要

PSVA技术已经广泛应用于电视技术，但是残像问题仍然没有解决，为了改善PS-VA电视屏的IS表现，本文通过UV1和UV2制程影响RM来研究RM的残留量与IS表现的关系，结果表明RM残留量和IS有很强的相关性。众所周知，离子浓度是IS问题的关键因素，基于分析RM残留量和离子浓度的关系，我们开了一种改善PS-VA模式IS问题的新技术，另外，本文提出通过设计新的母体混晶材料，使PS-VA制程后液晶具有更低RM残留量来改善IS问题，同时通过大量的测试数据验证改善效果，其中离子浓度由Toyo6254测试，通过SEM和AFM来分析表面形态。

Abstract

Well known PS-VA technology has been extensively used for TV application

but the image sticking issue is still a concern. In order to improve the image sticking performance of PS-VA TV panel

the condition of both UV1 and UV2 process are investigated to find out the relationship between the residual amount of RM and the image sticking performance. It shows that the image sticking performance is related to the RM residual amount. As we know

ion density is a factor of image sticking issue. Based on analysis on the relationship between ion density and RM residual amount

we develop a new technology to reduce the image sticking issue in PS-VA mode. Furthermore

another method is provided in this work to improve the image sticking performance by designing a new LC host mixture which has lower residual amount of RM. The technical data is obtained including ion density data measured by Toyo 6254 and surface profile investigation by SEM and AFM.

关键词

Keywords

references

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PS-VA模式中RM残留量对信赖性的影响