TFT-LCD Stage Mura的研究与改善

肖洋; 周鹏; 闫润宝; 郑云友; 齐勤瑞; 魏崇喜; 章旭; 张然

doi:10.3788/YJYXS20173204.0269

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TFT-LCD Stage Mura的研究与改善

材料与器件 | 更新时间：2020-07-07

- TFT-LCD Stage Mura的研究与改善
- Research and improvement of TFT-LCD Stage Mura
- 液晶与显示 2017年32卷第4期页码：269-274
- 作者机构：
  
  北京京东方显示技术有限公司, 北京 100176
- 作者简介：
  
  [ "肖洋 (1987-), 男, 天津人, 本科, 高级工程师, 主要从事液晶显示面板的生产和工艺相关工作。E-mail:xiaoyang@boe.com.cn" ]
  [ "周鹏 (1987-), 男, 湖北人, 本科, 高级工程师, 主要从事液晶显示面板的生产和工艺相关工作。E-mail:zhoupeng@boe.com.cn" ]
  闫润宝 (1983-), 男, 吉林人, 硕士, 高级工程师, 主要从事液晶显示面板的生产和工艺相关工作。E-mail:yanrunbao@boe.com.cn
- 基金信息：
- DOI：10.3788/YJYXS20173204.0269
  中图分类号： TN141.9
- 收稿日期：2016-08-23，
  
  录用日期：2016-10-18，
  
  纸质出版日期：2017-04
- 稿件说明：
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肖洋, 周鹏, 闫润宝, 等. TFT-LCD Stage Mura的研究与改善[J]. 液晶与显示, 2017,32(4):269-274.

Yang XIAO, Peng ZHOU, Run-bao YAN, et al. Research and improvement of TFT-LCD Stage Mura[J]. Chinese journal of liquid crystals and displays, 2017, 32(4): 269-274.
肖洋, 周鹏, 闫润宝, 等. TFT-LCD Stage Mura的研究与改善[J]. 液晶与显示, 2017,32(4):269-274. DOI： 10.3788/YJYXS20173204.0269.

Yang XIAO, Peng ZHOU, Run-bao YAN, et al. Research and improvement of TFT-LCD Stage Mura[J]. Chinese journal of liquid crystals and displays, 2017, 32(4): 269-274. DOI： 10.3788/YJYXS20173204.0269.

摘要

TFT-LCD面板在屏幕上有斑点或波浪状Mura，影响液晶显示器的品质，经过图形匹配，缺陷与曝光机机台形貌匹配。通过对异常区域特性分析，发现异常区域的BMCD、BM像素间距存在异常。对原因进行模型分析：玻璃在曝光机基台上局部区域发生弯曲，曝光距离变短，致使BMPR受光区域变小，BMCD会偏小，进而导致区域性透过光不均一产生Mura；玻璃弯曲后BM像素间距相对于设计位置也会发生变化，从而导致漏光产生Mura。经过实验验证，BMCD和像素间距的偏差主要由机台凸起导致glass弯曲引起，可以通过降低吸附压力和研磨机台，来改善CD差异和像素间距偏移，同时像素间距偏移漏光，也可以通过增加CD来改善。最终通过BMCD增加、研磨机台和降低吸附压力措施，Stage Mura不良率由10.05%下降至0.11%。

Abstract

The spotted and striped Mura on TFT-LCD Panel degraded product quality. The defect pattern matched the exposure stage by analyzing. It was found that the BM CD and Pixel Pitch are abnormal through researching the abnormal area characteristic parameter. Model analysis based on Stage Mura indicated that the bending of glass on stage shorted the Exposure gap

which shrank the Exposure area

and minified CD and formed transmittance difference. The bending of glass also shifted the Pixel Pitch

which resulted in light leak and Mura. The experiment showed that the difference of BM CD and Pixel Pitch were caused by Stage flatness

which could be improved by polishing stage and decreasing vacuum adsorption pressure. The light leak of Pixel Pitch could be also improved by extending CD. Finally

the CF BM stage Mura was improved greatly by CD increasing

stage polishing

and vacuum adsorption pressure decreasing

and the Stage Mura defect ratio decreased from 10.5% to 0.11%.

关键词

Keywords

references

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