高PPI ADS产品白Mura不良产生原理及改善研究

桑胜光; 车晓盼; 王嘉黎; 郭红光; 井杨坤; 李泽; 游伟

doi:10.3788/YJYXS20163105.0435

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高PPI ADS产品白Mura不良产生原理及改善研究

材料与器件 | 更新时间：2020-08-12

- 高PPI ADS产品白Mura不良产生原理及改善研究
- Principle and improving research of white mura defect in high PPI ADS product
- 液晶与显示 2016年31卷第5期页码：435-441
- 作者机构：
  
  合肥京东方光电科技有限公司Cell技术部,安徽合肥,230012
- 作者简介：
- 基金信息：
- DOI：10.3788/YJYXS20163105.0435
  中图分类号： TP394.1;TH691.9
- 收稿日期：2015-12-23，
  
  修回日期：2016-01-15，
  
  纸质出版日期：2016-05-05
- 稿件说明：
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桑胜光, 车晓盼, 王嘉黎等. 高PPI ADS产品白Mura不良产生原理及改善研究[J]. 液晶与显示, 2016,31(5): 435-441

SANG Sheng-guang, CHE Xiao-pan, WANG Jia-li etc. Principle and improving research of white mura defect in high PPI ADS product[J]. , 2016,31(5): 435-441
桑胜光, 车晓盼, 王嘉黎等. 高PPI ADS产品白Mura不良产生原理及改善研究[J]. 液晶与显示, 2016,31(5): 435-441 DOI： 10.3788/YJYXS20163105.0435.

SANG Sheng-guang, CHE Xiao-pan, WANG Jia-li etc. Principle and improving research of white mura defect in high PPI ADS product[J]. , 2016,31(5): 435-441 DOI： 10.3788/YJYXS20163105.0435.

摘要

现有传统TFT-LCD 生产工艺中

Rubbing工艺在生产高PPI ADS产品的过程中

在改善Rubbing Mura不良时会使用H Cloth

但使用H Cloth Glass在经过Rubbing后ODF Rubbing Cleaner清洗时会出现白Mura不良。经过对白Mura不良Panel的微观解析

并结合H Cloth性质分析出白Mura不良是由于H Cloth自身的聚醋酸脂颗粒经过Rubbing Cleaner聚集造成的。从Rubbing Cleaner清洗时改变Glass表面性质(醇类可以有效改变界面性质)入手

通过使用IPA对Glass进行清洗以改变聚醋酸脂疏水性

使得聚醋酸脂颗粒更易被Rubbing Cleaner清洗掉来改善白Mura不良

并结合生产实际定期对IPA进行更换以保持IPA浓度处于一个稳定的区间

使得高PPI ADS产品白Mura不良发生率由改善前的3.42%降低至改善后的0.11%

白Mura不良得到非常有效的改善。

Abstract

In the traditional Process of TFT-LCD

H Cloth is always used to improve Rubbing Mura in the production of High PPI ADS Products

but when H Cloth is used

the White Mura Defect will appear after Rubbing Cleaner. By analyzing of White Mura Defect micro appearance and the nature of H Cloth

the White Mura Defect is caused by the gathering effect of Acetate Polymer after Rubbing Cleaner. In this paper

we change Acetate from Hydrophobic to Hydrophilic by changing the surface property of glass in the Rubbing Cleaner (alcohol can effectively change the interface property) and the Acetate Polymer particle is easily to be cleaned. In actual production

we replace IPA at regular period to keep the IPA concentration in stable range. As a result

the White Mura is effectively improved and controlled and the defect ratio is greatly decreased from 3.42% to 0.11%.

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Keywords

references

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