TFT-LCD残影不良的研究与改善

范恒亮; 汤展峰; 刘利萍; 李静; 黄静; 刘岩龙

doi:10.3788/YJYXS20163103.0270

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TFT-LCD残影不良的研究与改善

材料与器件 | 更新时间：2020-08-12

- TFT-LCD残影不良的研究与改善
- Research and improvement of TFT-LCD image-retention
- 液晶与显示 2016年31卷第3期页码：270-275
- 作者机构：
  
  合肥鑫晟光电科技有限公司,安徽合肥,中国,230012
- 作者简介：
- 基金信息：
- DOI：10.3788/YJYXS20163103.0270
  中图分类号： TN141.9
- 收稿日期：2015-09-08，
  
  修回日期：2015-10-11，
  
  纸质出版日期：2016-03-05
- 稿件说明：
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范恒亮, 汤展峰, 刘利萍等. TFT-LCD残影不良的研究与改善[J]. 液晶与显示, 2016,31(3): 270-275

FANG Heng-liang, TANG Zhang-feng, LIU Li-ping etc. Research and improvement of TFT-LCD image-retention[J]. , 2016,31(3): 270-275
范恒亮, 汤展峰, 刘利萍等. TFT-LCD残影不良的研究与改善[J]. 液晶与显示, 2016,31(3): 270-275 DOI： 10.3788/YJYXS20163103.0270.

FANG Heng-liang, TANG Zhang-feng, LIU Li-ping etc. Research and improvement of TFT-LCD image-retention[J]. , 2016,31(3): 270-275 DOI： 10.3788/YJYXS20163103.0270.

摘要

影像残留是TFT-LCD

特别是TN型产品常见的不良

对产品良率影响很大。本文从产品设计、工艺参数、工艺管控3个方面对残影进行分析。发现产品设计时Data线两侧段差过大

是导致残影发生的主要原因

通过增加配向膜厚度和摩擦强度值可以有效降低残影

实验得出配向膜膜厚高于110 nm

摩擦强度高于5.5 Nm时无残影发生。通过控制配向膜工程与摩擦工程间的延迟时间在5 h

摩擦工程与对盒工程间的延迟时间在10 h

并且严格管控ITO偏移量可以有效减少Panel内部电场

从而降低残影。通过以上措施

对于15.6HD产品

良率提升了10%

为企业高效生产奠定基础。

Abstract

Image-retention has always been a problem in the TFT-LCD production process

especially for the TN production

and already had a great influence on the production yield of the products. This article mainly discussed the three aspects which had the influence on the incidence of image-retention including product designs

process parameters and the process control. The results showed that the main reason of image-retention is the oversize of segment difference at both sides of the Data line during product designs. And it was found that image-retention could be reduced by increasing the alignment film thickness and the rubbing torque value. No image-retention occurs when the alignment film thickness and the rubbing torque value are higher than 110 nm and 5.5 Nm

respectively. It can lower the image-retention by controlling the ITO overlay and controlling the PI-Rub delay time in 5 h

Rub-Assy delay time in 10 h to reducing the internal electric field of panel. As for 15.6HD products

the yield increased by 10% through the above measures which might lay the foundation of high-efficient production for enterprises.

关键词

Keywords

references

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