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北华大学物理学院, 吉林吉林 132013
收稿日期:2015-02-10,
修回日期:2015-03-07,
纸质出版日期:2015-12-05
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高丽丽, 李淞菲, 曹天福等. N掺杂MgZnO薄膜的p型导电稳定性研究[J]. 液晶与显示, 2015,30(6): 925-929
GAO Li-li, LI Song-fei, CAO Tian-fu etc. Stability of P-type conductivity in nitrogen-doped MgZnO thin film[J]. , 2015,30(6): 925-929
高丽丽, 李淞菲, 曹天福等. N掺杂MgZnO薄膜的p型导电稳定性研究[J]. 液晶与显示, 2015,30(6): 925-929 DOI: 10.3788/YJYXS20153006.0925.
GAO Li-li, LI Song-fei, CAO Tian-fu etc. Stability of P-type conductivity in nitrogen-doped MgZnO thin film[J]. , 2015,30(6): 925-929 DOI: 10.3788/YJYXS20153006.0925.
利用磁控溅射技术
以Mg
0.06
Zn
0.94
O为陶瓷靶材
制备了N掺杂p型Mg
0.1
3
Zn
0.8
7
O薄膜
薄膜的电阻率为42.45cm
载流子浓度为3.7010
17
/cm
3
迁移率为0.40 cm
2
V
-1
s
-1
。研究了该薄膜p型导电性质在室温空气下随时间的变化情况。实验结果表明
薄膜的电阻率逐渐升高
载流子浓度降低
五个月以后
薄膜转变为n型导电
电阻率为85.58cm
载流子浓度为4.5310
16
/cm
3
迁移率为1.61 cm
2
V
-1
s
-1
。真空热退火后重新转变为p型。结果显示
其p型导电类型的转变与在空气中吸附H
2
O或H
2
等形成浅施主有关。
Using radio frequency magnetron sputtering
p-type N doped Mg
0.1
3
Zn
0.8
7
O film was deposited on quartz substrate with Mg
0.0
6
Zn
0.94
O target.The film has resistivity of 42.45cm
Hall mobility of 0.40 cm
2
V
-1
s
-1
and carrier concentration of 3.7010
17
/cm
3
.The stability of p-type conductivity in this film preserved in room temperature air ambient was studied.It is found that the resistivity increased and the carrier concentration decreased with time.The film transformed from p-type to n-type semiconductor with resistivity of 85.58cm
Hall mobility of 1.61 cm
2
V
-1
s
-1
and carrier concentration of 4.5310
16
/cm
3
after preservation for five months.The film transformed to p-type semiconductor again after thermal annealing under 10
-4
Pa.It can be deduced that
the p-type film reverts to n-type conductivity because hydrogen and water were adsorbed by film to create shallow donors in air ambient.
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