动态掩膜光刻在液晶取向中的应用

胡华超; 魏冰妍; 胡伟; 陆延青

doi:10.3788/YJYXS20132802.0199

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动态掩膜光刻在液晶取向中的应用

器件物理及器件制备技术 | 更新时间：2020-08-12

- 动态掩膜光刻在液晶取向中的应用
- Applications of Dynamic Mask Based Photolithography in Liquid Crystal Alignment
- 液晶与显示 2013年28卷第2期页码：199-203
- 作者机构：
  
  南京大学现代工程与应用科学学院,江苏南京,中国,210093
- 作者简介：
- 基金信息：
  
  教育部博士点专项科研基金(No.20120091120020)()
- DOI：10.3788/YJYXS20132802.0199
  中图分类号： O43;O753+.2
- 收稿日期：2013-01-15，
  
  修回日期：2013-01-26，
  
  纸质出版日期：2013-04-15
- 稿件说明：
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胡华超, 魏冰妍, 胡伟, 陆延青. 动态掩膜光刻在液晶取向中的应用[J]. 液晶与显示, 2013,28(2): 199-203

HU Hua-chao, WEI Bing-yan, HU Wei, LU Yan-qing. Applications of Dynamic Mask Based Photolithography in Liquid Crystal Alignment[J]. , 2013,28(2): 199-203
胡华超, 魏冰妍, 胡伟, 陆延青. 动态掩膜光刻在液晶取向中的应用[J]. 液晶与显示, 2013,28(2): 199-203 DOI： 10.3788/YJYXS20132802.0199.

HU Hua-chao, WEI Bing-yan, HU Wei, LU Yan-qing. Applications of Dynamic Mask Based Photolithography in Liquid Crystal Alignment[J]. , 2013,28(2): 199-203 DOI： 10.3788/YJYXS20132802.0199.

摘要

利用基于数控微镜阵芯片的微投影光刻系统将任意设定的图形投影到SD1取向涂层上

约束SD1分子的排列方向

进而控制液晶的区域取向。该动态掩膜光刻系统可用于液晶取向的任意图形制备和偏振控制

实际分辨率达到了5 m。基于SD1材料的可擦写特性

实现了不同一/二维码间的光控转换

并实现了任意灰度的分区控制。上述器件均可在外场作用下实现开关或调谐。该动态掩膜光刻技术可方便地实现实时、复杂的液晶图形取向控制

在信息显示与识别及可调光子学器件等方面有着广阔的应用前景。

Abstract

A micro-lithography system based on digital micro-mirror device is utilized in liquid crystal (LC) alignments. The projected images on SD1 guide the SDI molecular orientations of the command layer

and further determine the directors of LC. Both complex pattern fabrication and arbitrary polarization control could be accomplished on this system with resolution up to 5 m. Pattern transforming among different bar codes and subarea controlling of random gray scale have been demonstrated by means of the optical rewritability of SD1. These LC devices are switchable and tunable under applied fields. The dynamic LC photo-patterning technique may be widely used in information display and identification

tunable photonic devices

etc.

关键词

Keywords

references

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