The Acrylate resin layer has lower dielectric constant(

3.5)

better optical transparency

and can be spin-coated as a flat surface film easily. By using resin as passivation layer in the array process

the vertical gap is increased between the Common ITO and bus line and plannar the devices. This reduces unwanted capacitive coupling and enables the pixel electrode to be extended over the gate and data lines

thus increasing aperture area

specifi-cally decreases power. In this work

there were some problems between the resin passivation layer and pixel ITO

such as Mo attack

missing ITO and so on. After optimizing the process of ITO Etching

photosensitive resin and non-photosensitive resin perfectly match with ITO etchant and Resin Coating

the resin passivation layer is sucessfully applied to the TFT-LCD.