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1. 华南理工大学 电子与信息学院,广东 广州,510640
2. 广东工业大学 材料与能源学院, 广东 广州 510006,E-mail: liuyuan@gdut.edu.cn
收稿日期:2010-06-02,
修回日期:2010-08-05,
网络出版日期:2011-02-20,
纸质出版日期:2011-02-20
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刘远, 姚若河, 李斌. 非晶硅薄膜晶体管的热阻模型[J]. 液晶与显示, 2011,26(1): 28-33
LIU Yuan, YAO Ruo-he, LI Bin. Thermal Impedance Model for Amorphous Silicon Thin Film Transistors[J]. , 2011,26(1): 28-33
刘远, 姚若河, 李斌. 非晶硅薄膜晶体管的热阻模型[J]. 液晶与显示, 2011,26(1): 28-33 DOI: 10.3788/YJYXS20112601.0028.
LIU Yuan, YAO Ruo-he, LI Bin. Thermal Impedance Model for Amorphous Silicon Thin Film Transistors[J]. , 2011,26(1): 28-33 DOI: 10.3788/YJYXS20112601.0028.
基于能量方程、热流方程和边界条件
推导出了非晶硅薄膜晶体管的沟道热阻模型。采用该模型可准确预估器件有源层内的平均温度。在沟道热阻模型的基础上
考虑器件间场氧化层和金属互联线的影响
建立了非晶硅薄膜晶体管的二维热阻模型。采用该模型可描述器件有源层内温度的横向分布
并快速预估沟道内的最高结温。最后
将模型预测结果与器件模拟仿真结果进行了对比
两者拟合良好。
A channel thermal impedance model for amorphous silicon thin film transistor is derived from a system of coupled energy equation
heat flowing equation and boundary conditions. By the use of this model
the average temperature in the active region can be calculated. Then
by considering of the effects of field oxide and interconnects between devices
a two dimensional thermal model is developed. By the use of this model
the temperature distribution in the channel can be described and the maximum junction temperature can be calculated. The accuracy of the proposed model has been verified with the device simulation data.
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