TFT-LCD一种黑Mura机理分析及工艺验证改善

王耀杰; 杨宗顺; 熊奇; 朱建华; 熊永; 毕芳

doi:10.37188/YJYXS20203509.0927

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TFT-LCD一种黑Mura机理分析及工艺验证改善

材料与器件 | 更新时间：2020-09-08

- TFT-LCD一种黑Mura机理分析及工艺验证改善
- Process validation solution of TFT-LCD black Mura
- 液晶与显示 2020年35卷第9期页码：927-932
- 作者机构：
  
  重庆京东方光电科技有限公司, 重庆 400714
- 作者简介：
  
  [ "王耀杰(1989-), 男, 山西朔州人, 硕士, 高级工程师, 2014年于上海大学获得硕士学位, 主要从事液晶及半导体相关研究及改善工作。E-mail:wangyaojie@boe.com.cn" ]
- 基金信息：
- DOI：10.37188/YJYXS20203509.0927
  中图分类号： TN141.9
- 收稿日期：2020-03-05，
  
  修回日期：2020-06-17，
  
  录用日期：2020-6-17，
  
  纸质出版日期：2020-09-05
- 稿件说明：
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王耀杰, 杨宗顺, 熊奇, 等. TFT-LCD一种黑Mura机理分析及工艺验证改善[J]. 液晶与显示, 2020,35(9):927-932.

Yao-jie WANG, Zong-shun YANG, Qi XIONG, et al. Process validation solution of TFT-LCD black Mura[J]. Chinese journal of liquid crystals and displays, 2020, 35(9): 927-932.
王耀杰, 杨宗顺, 熊奇, 等. TFT-LCD一种黑Mura机理分析及工艺验证改善[J]. 液晶与显示, 2020,35(9):927-932. DOI： 10.37188/YJYXS20203509.0927.

Yao-jie WANG, Zong-shun YANG, Qi XIONG, et al. Process validation solution of TFT-LCD black Mura[J]. Chinese journal of liquid crystals and displays, 2020, 35(9): 927-932. DOI： 10.37188/YJYXS20203509.0927.

摘要

TFT-LCD面板生产过程中会出现各种Mura，尤其是电视大尺寸产品，对显示均一性要求很高。Mura现象种类多，原因差异性大，本文分析的Mura属于电视面板的特殊不良。为解决此黑Mura，首先进行了实物分析研究，通过液晶盒特性、表面微观以及电学分析确认实物未见明显异常，为极微观异常。采用目前实际可操作方法很难进行深入分析，需依靠工艺验证来明确，因此通过工艺验证确认到不良为配向膜清洗机相关，而清洗机独立单元繁多。依据不良可能的原因以及实际生产线的运营状况，设计了5项相关可行性实验：清洗速度降低，清洗后增加静置时间，紫外光清洗强度提升，毛刷远离基板以及清洗机高压二流体喷淋压力调整。通过以上工艺验证结果，推理出不良形成原因为电荷残留，并提出两个合理可行的改善方向，首先是减少基板在高压二流体喷淋下的停留，其次为增加监控或关闭高压二流体喷淋，使不良从0.94%降低至0.00%，提升了产品品质。

Abstract

Various Mura

especially in large size products which need high requirement for display uniformity

can appear during the production of TFT-LCD. There are many types of Mura phenomena which reasons are very different. The Mura analyzed in this paper belongs to the special defect of TV models. In order to solve the black Mura of TV

this paper firstly carries out defect analysis and research. Through the characteristics of cell and surface microscopic & electric analysis

it is confirmed that the defect is not obviously observed and extremely microscopic. There is no way to carry out further analysis using the practical methods currently

and it is necessary to rely on the factory process verification to find the crux of the problem. It is verification that the defect is related to the PI cleaner

but the cleaning machine has a large number of independent units

so five related feasibility tests are designed:reducing cleaning speed

increasing laying time after PI cleaner

increasing UV cleaning intensity

removing brush away from the glass and adjusting cleaner HPMJ pressure. The process results show that the mechanism is inferred

also two reasonable and feasible improvement directions are proposed:reducing glass retention under cleaner HPMJ and increasing monitoring or shutting down HPMJ. The defect can be reduced from 0.94% to 0.00%.

关键词

Keywords

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