ITO区黑化法修复亮点理论模型及工艺参数分析

吴国东; 乔律华; 韩海滨; 王彬; 张少芬; 聂竹华; 蔡云牧; 王贺卫

doi:10.37188/CJLCD.2020-0213

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ITO区黑化法修复亮点理论模型及工艺参数分析

器件物理及器件制备技术 | 更新时间：2021-02-07

- ITO区黑化法修复亮点理论模型及工艺参数分析
- Theoretical model and process parameter analysis of ITO area blackening method for repairing bright spot
- 液晶与显示 2021年36卷第2期页码：246-257
- 作者机构：
  
  合肥京东方显示技术有限公司, 安徽合肥 230012
- 作者简介：
  
  [ "吴国东(1991-), 男, 安徽安庆人, 硕士, 高级工程师, 2017年于合肥工业大学获得硕士学位, 主要从事液晶面板不良修复工作。E-mail:401195730@qq.com" ]
  王贺卫, E-mail：401195730@qq.com
- 基金信息：
- DOI：10.37188/CJLCD.2020-0213
  中图分类号： TN141.9;TP391.4
- 收稿日期：2020-08-25，
  
  修回日期：2020-09-18，
  
  录用日期：2020-9-18，
  
  纸质出版日期：2021-02
- 稿件说明：
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吴国东, 乔律华, 韩海滨, 等. ITO区黑化法修复亮点理论模型及工艺参数分析[J]. 液晶与显示, 2021,36(2):246-257.

Guo-dong WU, Lv-hua QIAO, Hai-bin HAN, et al. Theoretical model and process parameter analysis of ITO area blackening method for repairing bright spot[J]. Chinese journal of liquid crystals and displays, 2021, 36(2): 246-257.
吴国东, 乔律华, 韩海滨, 等. ITO区黑化法修复亮点理论模型及工艺参数分析[J]. 液晶与显示, 2021,36(2):246-257. DOI： 10.37188/CJLCD.2020-0213.

Guo-dong WU, Lv-hua QIAO, Hai-bin HAN, et al. Theoretical model and process parameter analysis of ITO area blackening method for repairing bright spot[J]. Chinese journal of liquid crystals and displays, 2021, 36(2): 246-257. DOI： 10.37188/CJLCD.2020-0213.

摘要

本文基于飞秒激光烧蚀机制建立并通过实验验证了ITO区黑化法修复亮点的理论模型，分析了各个工艺参数对修复效果的影响，为亮点不良修复成功率的提升奠定基础。首先通过一系列实验点灯检测、显微镜图片和聚焦离子束（FIB）图片分析结果验证了所创建的修复理论模型；然后利用对比试验分别探究了单脉冲激光单位面积的能量密度

、扫描速度

、激光频率

和光斑大小

等工艺参数对ITO区黑化效果的影响；最后为了深入分析ITO区黑化法的烧蚀机理，提出并验证了囊括所有工艺参数的变量"

"，成功地为亮点不良修复成功率的提升提供了理论依据。实验结果表明，

在4.0~10.0

m，

在1.0 mJ/mm

以上，

在4 250~12 500 mJ/mm

时，ITO烧蚀后的黑化效果均达到了暗点标准（≥ 95%），且在点灯条件下未产生其他不良。根据实验结果，将该理论模型和工艺参数分析应用到量产，亮点不良修复成功率达到了95.5%。

Abstract

Based on the ablation mechanism of femtosecond laser

the theoretical model of ITO area blackening method for repairing bright spots was established and verified through experiments

and in order to improve the success ratio of repair

the influence of various process parameters were also analyzed on the remediation effect. In this work

the repair mode was firstly established by a series of experiments with light detection test

microscope images and Focused Ion Beam(FIB) images. Then

process parameters that effect success ratio were analyzed by contrast experiments

and these parameters included the energy density per unit area of single-pulse laser

scanning speed

the laser frequency and sport size. Finally

in order to deeply analyze the ablation mechanism of ITO area blackening method

the variable "

" containing all process parameters was proposed and verified

and it successfully provides a theoretical basis for improving the success rate. Experimental results indicated that

when the spot size was 4.0~10.0

energy density per unit area of single-pulse laser was 1.0 mJ/mm

or more

and the "

" was 4 250~12 500 mJ/mm

the blackening effect of ITO after repairing was up to the dark point standard and other undesirable phenomenon was not produced. According to the experimental result

the theoretical model and process parameter analysis was applied to mass production

the success rate of bright spot defective repair reached to 95.5%.

关键词

Keywords

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