TFT制程曝光色差研究

黄霜霜; 喻玥; 马国永; 赵辉; 高文; 沈建华; 陈萍; 阳志林; 李连峰; 马新星

doi:10.37188/CJLCD.2020-0146

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TFT制程曝光色差研究

器件物理及器件制备技术 | 更新时间：2021-03-23

- TFT制程曝光色差研究
- Investigation on exposure Mura in TFT process
- 液晶与显示 2021年36卷第3期页码：412-419
- 作者机构：
  
  南京中电熊猫平板显示科技有限公司, 江苏南京 210046
- 作者简介：
  
  [ "黄霜霜(1992-), 男, 江西九江人, 学士, 2014年于南京林业大学获得学士学位, 主要从事TFT工艺开发工作。E-mail:huangshuangshuang@ncpd.com.cn" ]
- 基金信息：
- DOI：10.37188/CJLCD.2020-0146
  中图分类号： TN27
- 收稿日期：2020-06-11，
  
  录用日期：2020-10-25，
  
  纸质出版日期：2021-03
- 稿件说明：
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黄霜霜, 喻玥, 马国永, 等. TFT制程曝光色差研究[J]. 液晶与显示, 2021,36(3):412-419.

Shuang-shuang HUANG, Yue YU, Guo-yong MA, et al. Investigation on exposure Mura in TFT process[J]. Chinese journal of liquid crystals and displays, 2021, 36(3): 412-419.
黄霜霜, 喻玥, 马国永, 等. TFT制程曝光色差研究[J]. 液晶与显示, 2021,36(3):412-419. DOI： 10.37188/CJLCD.2020-0146.

Shuang-shuang HUANG, Yue YU, Guo-yong MA, et al. Investigation on exposure Mura in TFT process[J]. Chinese journal of liquid crystals and displays, 2021, 36(3): 412-419. DOI： 10.37188/CJLCD.2020-0146.

摘要

在TFT制程中，曝光工艺直接影响到薄膜的最终图案质量。为了分析与解决曝光色差问题，需对面板的点灯现象与制备工艺进行调查与研究。首先，通过扫描电子显微镜分析、错位曝光试验、数据分析等方法进行不良原因调查。同时，借助开源软件GIMP和Fiji进行图像处理得到面板灰度数据，对色差程度进行定量评价。然后，通过调整曝光设备照度均一性与管控最优生产路径，曝光色差发生率从10%以上降至1%以内，有效改善面板显示品质。最后，结合ExpertLCD光学模拟数据与电容耦合效应分析，进一步阐述曝光色差的形成机理。研究发现，像素电极临界尺寸应管控在一定范围并且需保证较好的均一性，像素电极临界尺寸过小、过大都会使曝光色差更易显现。同时，各导电层的临界尺寸也需保证较好的均一性，以减小耦合电容对显示的影响。

Abstract

In the TFT manufacturing process

the exposure process directly affects the quality of the final pattern of the film. In order to analyze and solve the exposure Mura problem

it is necessary to investigate and study the lighting phenomenon of the panel and manufacturing process. Firstly

the cause of failure was investigated by scanning electron microscope analysis

shift exposure experiment

and data analysis. At the same time

with the help of the open source software GIMP and Fiji perform image processing to obtain panel gray data

the Mura degree was quantitavely evaluated. Then

the ratio of exposure Mura was decreased from above 10% to below 1% through adjusting the illumination uniformity of exposure equipment and controlling the optimal production path

effectively improving the panel display quality. Finally

the formation mechanism of exposure Mura was further elaborated based on ExpertLCD optical simulation data and capacitive coupling effect analysis. It is found that pixel CD should be controlled within a certain range and good uniformity. If the pixel CD is too small or too large

the exposure Mura will be easier to appear. Meanwhile. The CD of each conductive layer also needs to ensure good uniformity to reduce the effect of coupling capacitance on the display.

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references

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