
浏览全部资源
扫码关注微信
北京京东方显示技术有限公司
收稿日期:2012-04-28,
修回日期:2012-06-17,
网络出版日期:2012-07-12,
纸质出版日期:2012-02-15
移动端阅览
赵建. 分数阶微分在图像纹理增强中的应用[J]. 液晶与显示, 2012,27(1): 121-124
ZHAO Jian. Fractional Differential and Its Application in Image Texture Enhancement[J]. , 2012,27(1): 121-124
横线Mura是一种在TFT-LCD生产过程中产生的不良,对于画面品质有较大的影响。本文对横线Mura发生的原因进行分析,通过对金属膜层的应力测量及分析不良区域金属断面结构。认为横线Mura的发生是由于在栅电极成膜过程中,玻璃基板中心和边缘的Mo金属层的应力差异较大,造成在应力释放后Mo金属层与玻璃基板之间结合不紧密,从而影响到栅电极与源电极间的寄生电容参数发生变化,信号电平发生偏移所致。提出对栅电极膜层结构进行调整,将栅电极底层Mo金属膜去除可以有效的降低不良的发生比率,并进行了相关验证。
Horizontal Line Mura is one kind of defect during TFT-LCD manufacturing process. This defect will affect display quality seriously. After analyzed the profile of the metal layer and measured the stress status of metal film
the root cause can be revealed. It shows that during deposition process of metal film on glass substrate
the stress of Mo layer different a lot between the center area and glass edge. And this caused the loose of Mo layer
which affect the capacitor between gate and source electrode. Then cause display voltage on pixel shifted. To solve this issue
adjust Gate layer stack ratio by remove bottom Mo layer is effective to reduce the failure rate. And this can be demonstrated by experiment.
张龙,朱健,吴璟,等.磁控溅射制备低应力金属膜的工艺研究[J]. 中国机械工程: 2005,16(14)[2]田民波,叶锋. TFT LCD面板设计与构装技术[M].叶锋面板设计与构装技术北京科学出版社,2010,:-[3]黄子强. 液晶显示原理[M]. 第2版. 北京: 国防工业出版社, 2008: 260~271[4]Milton Ohring. Materials Science of Thin Films[M]. Second Edition. Singapore: Elsevier Pte Ltd., 2006: 711~776[5]吴洪江, 王威, 龙春平. 一种TFT-LCD Vertical Block Mura的研究与改善[J]. 液晶与显示,2007,22(4):-
0
浏览量
51
下载量
0
CSCD
关联资源
相关文章
相关作者
相关机构
京公网安备11010802024621