氮化硅在触摸屏中的应用分析

曲连杰; 陈旭; 郭建; 闵泰烨; 谢振宇张文余

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氮化硅在触摸屏中的应用分析

材料物理和化学 | 更新时间：2020-08-12

- 氮化硅在触摸屏中的应用分析
- Silicon Nitride Materials Applied in Touch Sensor
- 液晶与显示 2012年27卷第4期页码：466-470
- 作者机构：
- 作者简介：
- 基金信息：
- DOI：
  中图分类号： TN27;O433.3;TN141.9
- 收稿日期：2012-02-28，
  
  修回日期：2012-04-05，
  
  网络出版日期：2012-04-09，
  
  纸质出版日期：2012-08-15
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曲连杰陈旭郭建闵泰烨谢振宇张文余. 氮化硅在触摸屏中的应用分析[J]. 液晶与显示, 2012,27(4): 466-470

. Silicon Nitride Materials Applied in Touch Sensor[J]. , 2012,27(4): 466-470
曲连杰陈旭郭建闵泰烨谢振宇张文余. 氮化硅在触摸屏中的应用分析[J]. 液晶与显示, 2012,27(4): 466-470 DOI：

. Silicon Nitride Materials Applied in Touch Sensor[J]. , 2012,27(4): 466-470 DOI：

摘要

本文研究了氮化硅材料在触摸屏领域中的应用，利用等离子体化学气相沉积（PECVD）技术，在一定厚度的玻璃表面沉积不同厚度的氮化硅薄膜。通过理论分析和试验测试的方法得到了氮化硅膜层厚度和折射率对触摸屏透过率以及表面宏观颜色的影响。分析结果表明，氮化硅膜层折射率对触摸屏的平均透过率影响明显，而膜层厚度对触摸屏的平均透过率影响很小，但是膜层厚度的改变对触摸屏特定波长处透过率和膜层宏观颜色影响很明显。在实际生产中可以通过改变沉积条件获得合适折射率及厚度的氮化硅薄膜材料。

Abstract

The use of silicon nitride (SiNx) in the field of touch sensor has been investigated in this paper. Silicon Nitride (SiNx) with different thickness is deposited on the surface of bare glass by plasma-enhanced chemical vapor deposition (PECVD) technology. Using theoretical analysis and experimental test method

this article illuminates the impact on the touch sensor of transmittance and macro-color caused by film thickness and the refractive index. The results show that the refractive index of SiNx has great impact on the average transmittance

while the film thickness has no obvious effect on it. The film thickness has great impact on transmittance at fixed-wavelength and the macro-color

and it is crucial to the process control.

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references

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