纳米絮状碳膜的制备及场发射特性

崔雪菡; 顾广瑞

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纳米絮状碳膜的制备及场发射特性

器件制备技术及器件物理 | 更新时间：2020-08-12

- 纳米絮状碳膜的制备及场发射特性
- Preparation and Electron Field Emission Characteristics of Nano-Catkin Carbon Films
- 液晶与显示 2010年25卷第1期页码：57-61
- 作者机构：
  
  延边大学理学院物理系,吉林延吉 133002,E-mail: cuixuehan@yahoo.com.cn
- 作者简介：
- 基金信息：
- DOI：
  中图分类号： TN873.95
- 收稿日期：2009-05-21，
  
  修回日期：1900-01-02，
  
  网络出版日期：2010-02-20，
  
  纸质出版日期：2010-02-20
- 稿件说明：
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崔雪菡;顾广瑞. 纳米絮状碳膜的制备及场发射特性[J]. 液晶与显示, 2010,25(1): 57-61

CUI Xue-han;GU Guang-rui. Preparation and Electron Field Emission Characteristics of Nano-Catkin Carbon Films[J]. 液晶与显示, 2010,25(1): 57-61
崔雪菡;顾广瑞. 纳米絮状碳膜的制备及场发射特性[J]. 液晶与显示, 2010,25(1): 57-61 DOI：

CUI Xue-han;GU Guang-rui. Preparation and Electron Field Emission Characteristics of Nano-Catkin Carbon Films[J]. 液晶与显示, 2010,25(1): 57-61 DOI：

摘要

采用电子回旋共振等离子体化学气相沉积(ECR-CVD)技术

以CH

和H

为源气体

硅片为衬底制备了碳膜。利用拉曼光谱仪和扫描电子显微镜成功研究了基板偏压、沉积时间、CH

浓度等工艺参数的改变对碳膜絮状结构的影响。通过分析碳膜结构和形貌

得出纳米絮状碳膜的最佳工艺参数。通过电流密度-电场(

J-E

)曲线和Fowler-Nordheim(F-N)曲线

研究了CH

浓度对纳米絮状碳膜的场发射特性的影响。随着CH

浓度的增加

碳膜的阈值电场逐渐降低

发射电流密度逐渐增加。

Abstract

Nano-catkin films were prepared on Si substrates by means of electron cyclotron resonance microwave plasma chemical vapour deposition method in a hydrogen and methane mixture. The influences of substrates bias

concentration and deposition time on the nano-catkin structure of carbon film were investigated by Raman spectroscopy and scanning electronic microscope

respectively. The optimal deposition conditions were obtained by analyzing the images of nano-catkin film. The field emission characteristics were analyzed by using the current density versus electric field (

J-E

) curves and Fowler-Nordheim (F-N) curves. The threshold electric field of nano-catkin carbon films was reduced with increasing the CH

concentration

at the same time emission current density was increased.

关键词

Keywords

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