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1. 重庆邮电大学 计算机学院,四川 重庆,400065
2. 重庆邮电大学 光电学院,四川 重庆 400065,E-mail:caixm@cqupt.edu.cn
收稿日期:2008-12-18,
修回日期:1900-01-02,
网络出版日期:2009-08-30,
纸质出版日期:2009-08-30
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蔡雪梅;周应华. 反铁电体电子发射性能的研究[J]. 液晶与显示, 2009,24(04): 502-506
CAI Xue-mei;ZHOU Ying-hua. Electron Emission Properties of Antiferroelectrics[J]. 液晶与显示, 2009,24(04): 502-506
进行了锆钛酸铅反铁电体和铁电体的电子发射对比实验
研究了抽取电压、电极绝缘保护层和相变特性等对反铁电体电子发射性能的影响。通过涂覆绝缘保护层
大幅提高了表面击穿阈值
从而提高了施加场强;通过施加抽取电压
提高了发射电流密度。两种方式均使电流发射密度得到提高
最高达到153 A/cm
2
。利用相变理论
得到反铁电体相变时的强扩散和表面的半导性使局部或表面相变温度下降
相变温度的下降有助于电子发射
合理解释了观察到的反铁电体中发射电流密度比铁电体更高和电子发射起始阈值更低的现象。
The electron emission results in antiferroelectrics and ferroelectrics were compared and effects of the abstract field
the insulation layer on the electrode and the phase transition properties on the results of electron emission in antiferroelectrics are researched. More electrons were collected and higher current densities were obtained while the abstract field was higher. An insulation layer was coated on the electrode of the sample to prevent the discharge between the emission surface and the rear electrode so that the exerted field could be greatly enhanced and higher current density was obtained under this condition. Thus the maximum electron emission current density was increased to 153 A/cm
2
in antiferroelectrics by these two method. The lower curie temperature due to the strong diffusion during phase transition and the semi-conductivity of the surface layer makes electron emission easier
thus a lower starting threshold of emission and a higher electron emission current density were observed in antiferroelectrics than that in ferroelectrics.
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