Effect of periphery design of TFT substrate on the diffusion of polyimide solution

Jin-gui LIU; Sheng-jie YIN; Ke-ke GU; Guang-qiang LI; Ming SHEN; Xiao LI; Ni YANG; Heng-yi XU; Jian-yong LUO

doi:10.3788/YJYXS20203503.0205

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Effect of periphery design of TFT substrate on the diffusion of polyimide solution

Materials and Devices | 更新时间：2020-08-12

- Effect of periphery design of TFT substrate on the diffusion of polyimide solution
- Chinese Journal of Liquid Crystals and Displays Vol. 35, Issue 3, Pages: 205-210(2020)
- 作者机构：
  
  重庆京东方光电科技有限公司, 重庆 400700
- 作者简介：
- 基金信息：
- DOI：10.3788/YJYXS20203503.0205
  CLC： TN.141.9
- Received：08 October 2019，
  
  Revised：12 November 2019，
  
  Accepted：12 November 2019，
  
  Published：05 March 2020
- 稿件说明：
移动端阅览
Jin-gui LIU, Sheng-jie YIN, Ke-ke GU, et al. Effect of periphery design of TFT substrate on the diffusion of polyimide solution[J]. Chinese journal of liquid crystals and displays, 2020, 35(3): 205-210.
DOI：

Jin-gui LIU, Sheng-jie YIN, Ke-ke GU, et al. Effect of periphery design of TFT substrate on the diffusion of polyimide solution[J]. Chinese journal of liquid crystals and displays, 2020, 35(3): 205-210. DOI： 10.3788/YJYXS20203503.0205.

摘要

为提高产能，笔记本电脑超高级超维场开关（HADS）显示产品的聚酰亚胺（PI）膜涂布方式从滚筒涂布的感光树脂转印版（APR）转印变更为喷墨打印，涂布方式的变更造成了PI液滴在面板周边

com

过孔和走线密集处扩散困难，难以扩散的PI液滴在面板边缘聚集形成周边黑线不良。首先，通过变更PVX（passivation SiN

，钝化层）掩膜版解决

com

过孔周边PI液扩散不均问题，即通过改变面板周边过孔周期、尺寸以及距离像素区间距来减小过孔存在的影响，GP（Gate pad）侧过孔数量变为原来1/8，过孔面积比原来减小了98%，DP（Date pad）侧过孔数量变为原来的1/9，过孔面积比原来减小99%，同时DP侧过孔与像素区间距增大60%，PVX掩膜版变更极大地改善了PI液滴在过孔周围的扩散均匀性，最终周边黑线发生率从100%减小为6.6%。其次，通过变更喷墨打印涂布工艺来减小面板周边PI液积聚程度，我们开发出喷墨打印边缘补正功能，即保持像素区膜厚不变，面板边缘区域膜厚减少。边缘区域PI液的减少降低了该区域PI液积聚的可能性，边缘补正功能使得周边黑线发生率从6.6%降至0.5%。再次，阵列基板采用条形涂覆方式，即GP侧PI液全涂覆，周边黑线不良发生率降至0.05%。通过变更PVX掩膜版设计和喷墨打印涂布工艺参数，周边黑线不良发生率从100%减小为0.05%，满足量产需求。

Abstract

To improve the production capacity

the PI (polyimide) film coating method of High Advanced Dimension Switch (HADS) products is changed from APR transfer printing (Roller Coater) to inkjet printing(Inkjet Printer). The change of coating method causes the accumulation of polyimide (PI) solution near the

com

via

hole and

com

line which exists in the peripheral zone

which causes a failure named "peripheral black line". Firstly

we can solve the diffusion problem of PI solution by changing PVX (passivation SiN

) mask

that is

to reduce the influence of

via

hole by changing the cycle

size and distance between

via

hole and active area. we reduce the cycle of

com

via

hole near gate pad (GP) area by a factor of eight

the occupied area of

com

via

hole decreases by 98% than before. In the meanwhile

we reduce the cycle of

com

via

hole near date pad (DP) area by a factor of nine

the occupied area of

com

via

hole decreases by 99%

the distance between

via

hole of GP area and AA area increases by 60% than before. The changing of PVX mask greatly improves the diffusion of PI solution

eventually

the failure rate of black line reduces from 100% to 6.6%. Secondly

we develop an edge compensation function of inkjet printer to reduce the accumulation of PI solution in peripheral area

that is

the PI thickness of peripheral area is half the active area

the reduction of PI solution in the EM area reduces the possibility of accumulation in the area

and then the failure rate of black line reduces from 6.6% to 0.5%. Thirdly

we change the coating mode from pattern coating to strip-type coating

that is

the GP area is filled with PI solution in all area

which reduces the failure rate from 0.5% to 0.05%. By changing the PVX mask design and process parameters of Inkjet printer

the incidence of peripheral black line defects are reduced from 100% to 0.05%

meeting the mass production needs.

关键词

Keywords

references

S I KIM , M REE , T J SHIN , 等 . Synthesis of new aromatic polyimides with various side chains containing a biphenyl mesogen unit and their abilities to control liquid‐crystal alignments on the rubbed surface . Journal of Polymer Science Part A: Polymer Chemistry , 1999 . 37 ( 15 ): 2909 - 2921 . DOI: 10.1002/(SICI)1099-0518(19990801)37:15<2909::AID-POLA24>3.0.CO;2-B http://doi.org/10.1002/(SICI)1099-0518(19990801)37:15<2909::AID-POLA24>3.0.CO;2-B .

J J GE , C Y LI , G XUE , 等 . Rubbing-induced molecular reorientation on an alignment surface of an aromatic polyimide containing cyanobiphenyl side chains . Journal of the American Chemical Society , 2001 . 123 ( 24 ): 5768 - 5776 . DOI: 10.1021/ja0042682 http://doi.org/10.1021/ja0042682 .

J H LIU , Z X LI , J T WU , 等 . New liquid-crystal alignment agents based on fluorinated polyimides with trifluoromethyl‐substituted benzene or diphenylether in the side chain . Journal of Polymer Science Part A: Polymer Chemistry , 2002 . 40 ( 10 ): 1583 - 1593 . DOI: 10.1002/pola.10239 http://doi.org/10.1002/pola.10239 .

K H LIU , Y C LO , C S CHUANG , 等 . Vertical alignment type small display panels with alignment layer formed by inkjet printing technology . SID Symposium Digest of Technical Papers , 2007 . 38 ( 1 ): 1607 - 1610 . DOI: 10.1889/1.2785627 http://doi.org/10.1889/1.2785627 .

P J SU , Y A SHA , J W SHIU . Novel application of ink-jet-printing technology in multi-domain alignment liquid-crystal displays . Journal of the Society for Information Display , 2008 . 16 ( 3 ): 441 - 449 . DOI: 10.1889/1.2896322 http://doi.org/10.1889/1.2896322 .

范志新 , 潘良玉 , 孙玉宝 , 等 . 液晶显示器中液晶分子取向膜边缘的轮廓 . 光学技术 , 2003 . 29 ( 2 ): 183 - 184, 187 . DOI: 10.3321/j.issn:1002-1582.2003.02.004 http://doi.org/10.3321/j.issn:1002-1582.2003.02.004 .

Z X FAN , L Y PAN , Y B SUN , 等 . Surface edge shapes of orientation films in liquid crystaldevices . Optical Technique , 2003 . 29 ( 2 ): 183 - 184, 187 . DOI: 10.3321/j.issn:1002-1582.2003.02.004 http://doi.org/10.3321/j.issn:1002-1582.2003.02.004 .

王海成 , 申载官 , 刘萌 , 等 . 窄边框产品周边配向膜Mura分析及改善研究 . 电子世界 , 2018 . ( 5 ): 5 - 7 . http://d.old.wanfangdata.com.cn/Periodical/dzsj201810003 http://d.old.wanfangdata.com.cn/Periodical/dzsj201810003 .

H C WANG , J G SHEN , M LIU , 等 . Analysis and improvement of side polyimide Mura in narrow border products . Electronics World , 2018 . ( 5 ): 5 - 7 . http://d.old.wanfangdata.com.cn/Periodical/dzsj201810003 http://d.old.wanfangdata.com.cn/Periodical/dzsj201810003 .

赵成明 , 王丹 , 马国靖 , 等 . 阵列基板设计对配向膜印刷的影响 . 液晶与显示 , 2016 . 31 ( 2 ): 138 - 141 . http://yjyxs.com/CN/abstract/abstract9970.shtml http://yjyxs.com/CN/abstract/abstract9970.shtml .

C M ZHAO , D WANG , G J MA , 等 . Alignment film on array substrate . Chinese Journal of Liquid crystals and Displays , 2016 . 31 ( 2 ): 138 - 141 . http://yjyxs.com/CN/abstract/abstract9970.shtml http://yjyxs.com/CN/abstract/abstract9970.shtml .

徐长健 , 陆顺沙 , 马国靖 , 等 . 周边配向膜Mura改善研究 . 液晶与显示 , 2018 . 33 ( 10 ): 831 - 835 . http://yjyxs.com/CN/abstract/abstract10369.shtml http://yjyxs.com/CN/abstract/abstract10369.shtml .

C J XU , S S LU , G J MA , 等 . Improvement of peripheral PI Mura . Chinese Journal of Liquid Crystals and Displays , 2018 . 33 ( 10 ): 831 - 835 . http://yjyxs.com/CN/abstract/abstract10369.shtml http://yjyxs.com/CN/abstract/abstract10369.shtml .

胡福增 , 陈国荣 , 杜永娟 . 材料表界面 , 2版 : 上海华东理工大学出版社 , 2007 .

F Z HU , G R CHEN , Y J DU . Material Surface and Interface , 2nd ed : .Beijing East China University of Science and Technology Press , 2007 .

M RUBINSTEIN , R H COLBY . Polymer Physics , : New York Oxford University Press , 2003 .

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Related Institution

Department of Electronic Engineering, Tianjin University of Technology and Education, Tianjin 300222, China,E-mail:wgw1631@163.com

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