Research and improvement of TFT white color uniformity based on SiN<sub><italic style="font-style: italic">x</italic></sub> film

Bin-bin CAO; Cheng-zhi YE; Hui AN; Li MA; Guang-dong LIU; Yan-ming LYU; Jun-lin PENG; Zeng-

doi:10.3788/YJYXS20193412.1166

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Research and improvement of TFT white color uniformity based on SiN_x film

Materials and Devices | 更新时间：2020-07-16

- Research and improvement of TFT white color uniformity based on SiN_x film
- Chinese Journal of Liquid Crystals and Displays Vol. 34, Issue 12, Pages: 1166-1171(2019)
- 作者机构：
  
  合肥鑫晟光电科技有限公司, 安徽合肥 230001
- 作者简介：
- 基金信息：
- DOI：10.3788/YJYXS20193412.1166
  CLC： O439
- Received：30 May 2019，
  
  Accepted：27 September 2019，
  
  Published：05 December 2019
- 稿件说明：
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Bin-bin CAO, Cheng-zhi YE, Hui AN, et al. Research and improvement of TFT white color uniformity based on SiN_x film[J]. Chinese journal of liquid crystals and displays, 2019, 34(12): 1166-1171.
DOI：

Bin-bin CAO, Cheng-zhi YE, Hui AN, et al. Research and improvement of TFT white color uniformity based on SiN_x film[J]. Chinese journal of liquid crystals and displays, 2019, 34(12): 1166-1171. DOI： 10.3788/YJYXS20193412.1166.

摘要

基于相同点位分别测试了TFT白点色度均匀性（WCU）和各层氮化硅（SiN

）膜厚，并分析了二者的关联性，发现TFT WCU与栅极绝缘层（GI）和第二绝缘层（PVX2）两层的相关性较大，而与厚度最薄，折射率最大的第一绝缘层（PVX1）最不相关；提出了降低GI层剩余厚度避免低速沉积GI（GL）的残留和降低PVX2膜层厚度以提升面内均一性的改善方案，最终使得产品的TFT WCU均值降低约0.000 7；最大值由改善前的0.007 0降至改善后的0.005 2，满足了最大值≤ 0.005 5的目标值，改善效果明显。

Abstract

TFT White Color Uniformity (WCU) and SiN

film thickness of each layer were tested based on the same test points and the correlation between them is analyzed. It is found that TFT WCU has a great correlation with GI and PVX2 layers rather than PVX1 layer with the thinnest THK and largest

value. On this basis

an improvement scheme to reduce the center value of GI Remain THK(to avoid the residue of GL layer) and PVX2 THK (to improve the uniformity in panel)at the same time is proposed

which can reduces the mean value of TFT WCU by about 0.000 7. After improvement

the maximum value can be decreased from 0.007 0 to 0.005 2 to satisfy the specification(maximum value ≤ 0.005 5). The effect of improvement is obvious.

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Keywords

references

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Research and improvement of TFT white color uniformity based on SiNx film

DOI：10.3788/YJYXS20193412.1166

摘要

Abstract

关键词

Keywords

references

Research and improvement of TFT white color uniformity based on SiN_x film