Effect of TFT-LCD developer parameters on halftone thickness

Guo CHEN; Ya-jun HAN; Hong-lu YU; Zhen-yong DING; Peng WANG; Won CHUL; Wei LI

doi:10.3788/YJYXS20193412.1161

您当前的位置：

首页 >

文章列表页 >

Effect of TFT-LCD developer parameters on halftone thickness

Materials and Devices | 更新时间：2020-07-16

- Effect of TFT-LCD developer parameters on halftone thickness
- Chinese Journal of Liquid Crystals and Displays Vol. 34, Issue 12, Pages: 1161-1165(2019)
- 作者机构：
  
  北京京东方显示技术有限公司, 北京 100176
- 作者简介：
- 基金信息：
- DOI：10.3788/YJYXS20193412.1161
  CLC： TN305.7
- Received：09 May 2019，
  
  Accepted：29 September 2019，
  
  Published：05 December 2019
- 稿件说明：
移动端阅览
Guo CHEN, Ya-jun HAN, Hong-lu YU, et al. Effect of TFT-LCD developer parameters on halftone thickness[J]. Chinese journal of liquid crystals and displays, 2019, 34(12): 1161-1165.
DOI：

Guo CHEN, Ya-jun HAN, Hong-lu YU, et al. Effect of TFT-LCD developer parameters on halftone thickness[J]. Chinese journal of liquid crystals and displays, 2019, 34(12): 1161-1165. DOI： 10.3788/YJYXS20193412.1161.

摘要

通过对TFT-LCD行业用显影液浓度（质量分数）

和其中酸根离子浓度（质量分数）

与半色调光刻胶膜厚（Half Tone Thickness，THK）的影响研究，提出了改善THK波动的方法。首先，固定光刻工艺生产条件，采用单因素实验法分别对

和

对THK的影响进行试验，研究表明，

、

的变化都会影响显影液的显影能力，导致THK的变化，且都呈线性负相关。其次，根据

和

变化对THK的影响程度，将二者之间建立公式对应关系，通过系统对

进行调整，改善

波动的影响。最终将关系公式导入系统，稳定了显影能力，有效改善了THK的波动，沟道相关不良发生率从0.20%以上降低到0.03%以下。

Abstract

The influence of concentration (mass fraction

) and concentration of acid radical ion (mass fraction

) of TFT-LCD developer on Halftone THK is researched

and the way to improve THK fluctuations is put forward. Firstly

the production conditions of lithography process are fixed

then the influence of THK with

and

is respectively tested using the single factor experimental method. Studies show that the changes of

and

will affect the developer's development ability and lead to the changes of THK. THK with

and

are both linear negative correlation. Secondly

according to the influence degree of

and

changes on THK

the formula corresponding relations between the two is established. The

is adjusted through the system and then the

fluctuations are improved. Lastly

the development ability and the THK fluctuations are stable through putting the formula into the system which make channel related incidence reduced to below 0.03% from more than 0.20%.

关键词

Keywords

references

彭志红, 袁野, 林韵英, 等.国内液晶显示技术的发展概况[J].电视技术, 2013, 37(S2):425-426.

PENG Z H, YUAN Y, LIN Y Y, et al . Development review of crystal liquid display in China[J]. Video Engineering , 2013, 37(S2):425-426. (in Chinese)

马群刚.TFT-LCD原理与设计[M].北京:电子工业出版社, 2011.

MA Q G. Theory and Design of TFT-LCD [M]. Beijing:Publishing House of Electronics Industry, 2011. (in Chinese)

王新久.液晶光学和液晶显示[M].北京:科学出版社, 2006:45-49.

WANG X J. Liquid Crystal Optics & Liquid Crystal Display [M]. Beijing:Science Press, 2006:45-49. (in Chinese)

刘亮, 王向楠, 赵德友, 等. TFT-LCD移动显示窄边框技术进展[J].液晶与显示, 2013, 28(2):228-232.

LIU L, WANG X N, ZHAO D Y, et al . Slim border trend of TFT-LCD mobile display panel[J]. Chinese Journal of Liquid Crystals and Displays , 2013, 28(2):228-232. (in Chinese)

张玉虎, 岳浩, 王军帽, 等. TFT光刻DICD均一性改善优化[J].液晶与显示, 2016, 31(10):929-935.

ZHANG Y H, YUE H, WANG J M, et al . Improvement of uniformity of TFT lithography DICD[J]. Chinese Journal of Liquid Crystals and Displays , 2016, 31(10):929-935. (in Chinese)

甄娟.半色调掩膜在TFT-LCD中的应用[J].科技创新与应用, 2015, 31:76.

ZHEN J. Application of halftone mask in TTT-LCD[J]. Technology Innovation and Application, 2015, 31:76.

GUO J, KIM K Y, RIM S M, et al . Analysis and experiment result of diffraction and interference phenomenon in halftone mask fine pattern forming process[J]. Chinese Journal of Liquid Crystals and Displays , 2008, 23(3):327-333.

谷至华.薄膜晶体管(TFT)阵列制造技术[M].上海:复旦大学出版社, 2007.

GU Z H. Thin Film Transistor ( TFT ) Array Manufacturing Technology [M]. Shanghai:Fudan University Press, 2007. (in Chinese)

范学丽, 靖瑞宽, 翁超, 等.湿法刻蚀FICD均一性的影响因素及提高刻蚀均一性的研究[J].液晶与显示, 2016, 31(1):67-73.

FAN X L, JING R K, WENG C, et al . Improvement of etching uniformity and influence factors of wet etching of FICD uniformity[J]. Chinese Journal of Liquid Crystals and Displays , 2016, 31(1):67-73. (in Chinese)

陈崔军. TFT-LCD Array光刻制程CD均一性分析和实现[D].成都: 电子科技大学, 2018.

CHEN C J. Analysis and implementation of CD uniformity in TFTLCD Array lithography process[D]. Chengdu: University of Electronic Science and Technology of China, 2018. (in Chinese)

Views

下载量

CSCD

Alert me when the article has been cited

提交

Tools

Publicity Resources

No data

Related Author

No data

Related Institution

No data

AI问答

Address：No.3888 Dong Nanhu Road, Changchun, Jilin, China 130033 Postal code：130033
Tel：0431-86176059 Email：yjxs@ciomp.ac.cn
Technical support is provided by Beijing Founder electronics co., LTD 吉ICP备11002662号-17 京公网安备11010802024621
It is recommended to read the content of this site in Chrome&IE9+. Please switch to extreme mode in browser 360.
Cookies We use cookies to help provide and enhance our service and tailor content. By continuing, you agree to the use of cookies.

⁰