Improvement of stage Mura in high PPI TPC color filter products

Qian JIANG; La TA; Feng-ming XUE; Xu ZHANG; Ling-jian MENG; Kun WANG; Peng ZHOU; Xu WANG

doi:10.3788/YJYXS20193406.0537

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Improvement of stage Mura in high PPI TPC color filter products

Materials and Devices | 更新时间：2020-07-05

- Improvement of stage Mura in high PPI TPC color filter products
- Chinese Journal of Liquid Crystals and Displays Vol. 34, Issue 6, Pages: 537-542(2019)
- 作者机构：
  
  北京京东方显示技术有限公司, 北京 100176
- 作者简介：
- 基金信息：
- DOI：10.3788/YJYXS20193406.0537
  CLC： TN27
- Received：28 December 2018，
  
  Accepted：26 April 2019，
  
  Published：05 June 2019
- 稿件说明：
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Qian JIANG, La TA, Feng-ming XUE, et al. Improvement of stage Mura in high PPI TPC color filter products[J]. Chinese journal of liquid crystals and displays, 2019, 34(6): 537-542.
DOI：

Qian JIANG, La TA, Feng-ming XUE, et al. Improvement of stage Mura in high PPI TPC color filter products[J]. Chinese journal of liquid crystals and displays, 2019, 34(6): 537-542. DOI： 10.3788/YJYXS20193406.0537.

摘要

针对彩膜小尺寸高分辨率平板电脑产品的曝光基台色斑（Stage Mura）不良，对异常区域各项特性进行分析，发现Mura区域的黑矩阵（BM）的关键线宽（CD）和坡度角形貌与正常区存在异常。推测原因为曝光时，不良区域与正常区域曝光温度和曝光间隙存在差异，并进行试验验证。将曝光温度和曝光间隙进行调整试验后，使用扫描电子显微镜（SEM）分析黑矩阵关键线宽（BM CD）和坡度角，确认改善措施能减少正常区域和Mura区域BM CD和坡度角差异，不良发生率由7.2%降低为1.4%。进一步调整BM膜厚，从整体上弱化正常区域和Mura区域的透过率差异，最终基台色斑不良率降低至0.7%。

Abstract

As for the exposure stage Mura in small size and high PPI(Pixel Per Inch) TPC(Tablet Personal Computer) color filter product

it was found that the black matrix(BM) critical dimension(CD) and tape angle in Mura area are different from good area through the characteristic analysis. The reasons were supposed to be the difference of the temperature and gap between Mura area and good area during exposure process and were verified through experiments. After adjusting the exposure temperature and gap

the BM CD and Tape Angle were observed by scanning electron microscope(SEM) and it was found the difference between Mura area and good area were diminished. The stage Mura defect ratio decreases from 7.2% to 1.4% by the adjustment. Furthermore

to diminish the transmittance gap between Mura area and good area in general

the BM thickness is adjusted and the stage Mura defect ratio decreases to 0.6% finally.

关键词

Keywords

references

桑胜光, 车晓盼, 王嘉黎, 等.高PPI ADS产品白Mura不良产生原理及改善研究[J].液晶与显示, 2016, 31(5):435-441.

SANG S G, CHE X P, WANG J L, et al . Principle and improving research of white mura defect in high PPI ADS Product[J]. Chinese Journal of Liquid Crystals and Displays , 2016, 31(5):435-441. (in Chinese)

毕昕, 丁汉. TFT-LCD Mura缺陷机器视觉检测方法[J].机械工程学报, 2010, 46(12):13-19.

BI X, DING H. Machine vision inspection method of Mura defect for TFT-LCD[J]. Journal of Mechanical Engineering , 2010, 46(12):13-19. (in Chinese)

廖燕平, 宋勇志, 邵喜斌, 等.薄膜晶体管液晶显示器显示原理与设计[M].北京:电子工业出版社, 2016:340-341.

LIAO Y P, SONG Y Z, SHAO X B, et al . Thin Film Transistor Liquid Crystal Display [M]. Beijing:Publishing House of Electronics Industry, 2016:340-341. (in Chinese)

庞华山, 谭海洋, 武占英, 等.彩色滤光片Mura缺陷自动检测应用研究[J].科技创新与应用, 2017(28):1-6, 8.

PANG H S, TAN H Y, WU Z Y, et al . Research of application of Mura defect auto-inspection in color filter[J]. Technology Innovation and Application , 2017(28):1-6, 8. (in Chinese)

肖洋, 周鹏, 闫润宝, 等. TFT-LCD Stage Mura的研究与改善[J].液晶与显示, 2017, 32(4):269-274.

XIAO Y, ZHOU P, YAN R B, et al . Research and improvement of TFT-LCD Stage Mura[J]. Chinese Journal of Liquid Crystals and Displays , 2017, 32(4):269-274. (in Chinese)

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Related Institution

School of Materials Science & Engineering， Beijing Institute of Technology

R&D Center， TCL Electronics Holdings Limited

National & Local United Engineer Laboratory of Flat Panel Display Technology, College of Physics and Information Engineering, Fuzhou University

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Chengdu BOE Optoelectronics Technology Co. Ltd

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