Jia-xiang ZHANG, Wei WANG, Yan-qiang WANG, et al. Manufacture and process of high PS material[J]. Chinese journal of liquid crystals and displays, 2019, 34(3): 236-240.
DOI:
Jia-xiang ZHANG, Wei WANG, Yan-qiang WANG, et al. Manufacture and process of high PS material[J]. Chinese journal of liquid crystals and displays, 2019, 34(3): 236-240. DOI: 10.3788/YJYXS20193403.0236.
m high PS was prepared successfully in the G5 line. By tuning of VCD
&
softbake process and curing process
high PS material of no bubble and good membrane surface was obtained. The intensity of exposure influence on the PS was also studied in this paper. When lower than 50 mJ
PS material cannot shape effectively
when amount to 150 mJ
high PS with good appearance
to meet the design value
was received. Finally
the different base of high PS material was studied. When the base did not deal with tackifier
the adhesion of SiN basal was good
but the adhesion of Mo base still needed to optimize the processing.
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