Influence and research of TFT-LCD process on low frequency striped Mura

Xiao-xiang GU; Li YANG; Long ZENG

doi:10.3788/YJYXS20193402.0160

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Influence and research of TFT-LCD process on low frequency striped Mura

Materials and Devices | 更新时间：2020-07-05

- Influence and research of TFT-LCD process on low frequency striped Mura
- Chinese Journal of Liquid Crystals and Displays Vol. 34, Issue 2, Pages: 160-168(2019)
- 作者机构：
  
  昆山龙腾光电有限公司, 江苏昆山 215301
- 作者简介：
- 基金信息：
- DOI：10.3788/YJYXS20193402.0160
  CLC： TN27
- Received：05 April 2018，
  
  Accepted：20 December 2018，
  
  Published：05 February 2019
- 稿件说明：
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Xiao-xiang GU, Li YANG, Long ZENG. Influence and research of TFT-LCD process on low frequency striped Mura[J]. Chinese journal of liquid crystals and displays, 2019, 34(2): 160-168.
DOI：

Xiao-xiang GU, Li YANG, Long ZENG. Influence and research of TFT-LCD process on low frequency striped Mura[J]. Chinese journal of liquid crystals and displays, 2019, 34(2): 160-168. DOI： 10.3788/YJYXS20193402.0160.

摘要

LC配向的均一性在LCD中是必不可少的，光配向制程是通过施加紫外偏振光照射在IPS（In-Plane Switch）LCD中形成液晶配向沟槽的一种技术，然而紫外光照射的同时会损伤TFT器件，使非晶硅层产生光生载流子，电子发生迁移，导致TFT漏电流从而影响图像品质，产生横纹色差。在低频时，栅极开关时间延长，相邻扫描线之间容易发生混充电现象，部分充电截止的像素重新充电，从而使横纹色差变严重。本文从制程和电性调整方面对低频横纹色差进行了研究，结果表明：（1）紫外光照射后进行烘烤，可以有效降低漏电流，高温度（240℃）+长时间（4 200 s）改善低频横纹色差效果佳（比例：0.00%）；（2）延长Out Enable（4.8

s）+降低

（18 V）+提高GOA（Gate On Array）电路中电压

SS_Q

（-7.5 V），改善低频横纹色差效果佳（比例：0.00%）。

Abstract

Uniform LC alignment is indispensable in LCD

and photo-alignment process is one technology to form liquid crystal alignment grooves in IPS (In-Plane Switch) LCD by applying polarized UV irradiation. However

UV exposure treatment will simultaneously damage TFT device that produces photo generated electrons and electronic migration on amorphous silicon layer. The TFT leakage current will lead to poor image quality. At low frequency

mixed-charge phenomenon is easily occurred between neighboring scan line due to longer gate switching time

parts of off-pixels re-charged then enhance striped Mura appearance. In this paper

we discuss the impacts on low frequency Mura from process and electrical property. The results show that:(1) Applying thermal treatment after UV irradiation can effectively reduce the leakage current

high temperature (240℃)+ long time(4 200 s) can improve low frequency Mura(Ratio:0.00%); (2) Extending the out enable time (4.8

s)+reducing

(18 V)+increasing GOA circuit static operating point voltage

SS_Q

(-7.5 V) can improve low frequency Mura(Ratio:0.00%).

关键词

Keywords

references

王文根, 李瑛, 邵明, 等.液晶显示器的快速响应技术[J].现代显示, 2006(4):45-48.

WANG W G, LI Y, SHAO M, et al . Fast response technologies for LCD[J]. Advanced Display , 2006(4):45-48. (in Chinese)

周学芹, 杨丽, 刘政明, 等.光配向PI固烤时间与曝光能量对LCD光学及残影的影响[J].液晶与显示, 2017, 32(8):596-600.

ZHOU X Q, YANG L, LIU Z M, et al . Effects of PI post-bake time and UV dosage on LCD Optical performance and image sticking by photo-alignment[J]. Chinese Journal of Liquid Crystals and Displays , 2017, 32(8):596-600. (in Chinese)

KANICKI J. Amorphous and Microcrystalline Semiconductor Devices [M]. Boston:Artech House, 1992.

戴亚翔, 田民波. TFT LCD面板的驱动与设计[M].北京:清华大学出版社, 2008.

DAI Y X, TIAN M B. Design and Operation of TFT LCD Panels [M]. Beijing:Tsinghua University Press, 2008. (in Chinese)

宋萍, 李红敏, 李小和, 等.显示基板及显示面板的制作方法[R].2015.

SONG P, LI H M, LI X H, et al . Manufacturing methods of display base plate and display panel[R]. 2015.(in Chinese)

陈牡丹, 杨丽, 刘政明, 等.光配向制程参数对预倾角及其光电性能的影响[J].液晶与显示, 2017, 32(9):708-713.

CHEN M D, YANG L, LIU Z M, et al . Effects of photo-alignment process parameters on pre-tilt angle and photoelectric properties[J]. Chinese Journal of Liquid Crystals and Displays , 2017, 32(9):708-713. (in Chinese)

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