

浏览全部资源
扫码关注微信
1.上海交通大学, 上海 200240
2.昆山龙腾光电有限公司, 江苏 昆山 215301
Received:17 June 2018,
Accepted:09 August 2018,
Published:2018-12
移动端阅览
Hong-xia XU, Zong-fei ZOU, Cheng-yuan DONG. Novel integrated gate driver design based on a-IGZO TFTs[J]. Chinese journal of liquid crystals and displays, 2018, 33(12): 996-1001.
Hong-xia XU, Zong-fei ZOU, Cheng-yuan DONG. Novel integrated gate driver design based on a-IGZO TFTs[J]. Chinese journal of liquid crystals and displays, 2018, 33(12): 996-1001. DOI: 10.3788/YJYXS20183312.0996.
在传统集成栅驱动电路中采用非晶InGaZnO薄膜晶体管(a-IGZO TFT)后会造成信赖性的降低,经过分析确定原因为驱动TFT阈值电压漂移。本文提出了一种改进的集成栅驱动电路,通过对驱动TFT栅节点电压的稳定控制,获得了较大的驱动TFT阈值电压漂移冗余度(从原来的不到±-3 V扩大到±-9 V),克服了a-IGZO TFT阈值电压漂移所造成的电路失效,稳定了集成栅驱动电路并延长了液晶显示器面板的寿命。
Reliability of conventional integrated gate driver decreased with amorphous InGaZnO thin film transistors (a-IGZO TFTs) employed
which is assumed to result from the threshold voltage shift. Accordingly
An improved integrated gate circuit was proposed
which exhibited larger redundancy for the threshold voltage shift by controlling the Q-point voltage stability of driver TFTs. It prevented the circuit failure due to threshold voltage shift(
V
th
shift margin enlarged from less than ±-3 V to ±-9 V)
made integrated gate driver more stable
and led to longer life of liquid crystal display panels.
KAMIYA T, NOMURA K, HOSONO H. Present status of amorphous In-Ga-Zn-O thin-film transistors[J]. Science and Technology of Advanced Materials, 2010, 11(4):044305.
徐小丽, 刘如, 郭小军, 等.基于不同TFT技术的AMOLED像素电路仿真分析[J].液晶与显示, 2010, 25(4):565-568.
XU X L, LIU R, GUO X J, et al. Simulation and analysis of AMOLED pixel circuits with different TFT technologies[J]. Chinese Journal of Liquid Crystals and Displays, 2010, 25(4):565-568. (in Chinese)
张磊, 刘国超, 董承远.非晶铟镓锌氧薄膜晶体管钼/铜源漏电极的研究[J].发光学报, 2018, 39(6):823-829.
ZHANG L, LU G C, DONG C Y. Mo/Cu Source/drain electrades for amorphous InGaZnO thin film transiston[J].Chinese Journal of Luminescence, 2018, 39(6):823-829.(in Chinese)
MOON S H, LEE Y S, LEE M C, et al. Integrated a-Si:H TFT gate driver circuits on large area TFT-LCDs[J]. SID Symposium Digest of Technical Papers, 2007, 38(1):1478-1481.
刘翔, 薛建设, 贾勇, 等.金属氧化物IGZO薄膜晶体管的最新研究进展[J].现代显示, 2010, 21(10):28-32.
LIU X, XUE J S, JIA Y, et al. The recent research progress of amorphous indium gallium zinc oxide thin film transistors[J]. Advanced Display, 2010, 21(10):28-32. (in Chinese)
CONLEY J F. Instabilities in amorphous oxide semiconductor thin-film transistors[J]. IEEE Transactions on Device and Materials Reliability, 2010, 10(4):460-475.
KIKUCHI Y, NOMURA K, YANAGI H, et al. Device characteristics improvement of a-In-Ga-Zn-O TFTs by low-temperature annealing[J]. Thin Solid Films, 2010, 518(11):3017-3021.
DAO V A, TRINH T T, JANG K, et al. Trapping time characteristics of carriers in a-InGaZnO thin-film transistors fabricated at low temperatures for next-generation displays[J]. Journal of Electronic Materials, 2013, 42(4):711-715.
TRINH T T, VAN DUY NGUYEN, RYU K, et al. Improvement in the performance of an InGaZnO thin-film transistor by controlling interface trap densities between the insulator and active layer[J]. Semiconductor Science and Technology, 2011, 26(8):085012.
PARK S, BANG S, LEE S, et al. The effect of annealing ambient on the characteristics of an indium-gallium-zinc oxide thin film transistor[J]. Journal of Nanoscience and Nanotechnology, 2011, 11(7):6029-6033.
ONO S, MIWA K, MAEKAWA Y, et al. V T compensation circuit for AM OLED displays composed of two TFTs and one capacitor[J]. IEEE Transactions on Electron Devices, 2007, 54(3):462-467.
JANKOVIC N D, BRAJOVIC V. V th compensated AMOLED pixel employing dual-gate TFT driver[J]. Electronics Letters, 2011, 47(7):456-457.
DONG H K, HAN J U, MATIVENGA M, et al. Threshold voltage dependence on channel length in amorphous-indium-gallium-zinc-oxide thin-film transistors[J]. Applied Physics Letters, 2013, 102(8):083508.
AOI T, OKA N, SATO Y, et al. DC sputter deposition of amorphous indium-gallium-zinc-oxide (a-IGZO) films with H 2 O introduction[J]. Thin Solid Films, 2010, 518(11):3004-3007.
SEO D K, SHIN S, CHO H H, et al. Drastic improvement of oxide thermoelectric performance using thermal and plasma treatments of the InGaZnO thin films grown by sputtering[J]. Acta Materialia, 2011, 59(17):6743-6750.
LIAO C W. A new integrated a-Si:H TFT gate driver with Q node quasi-grounded[J]. SID, 2010, 55-59.
0
Views
78
下载量
2
CSCD
Publicity Resources
Related Articles
Related Author
Related Institution
京公网安备11010802024621