Chang-jian XU, Shun-sha LU, Guo-jing MA, et al. Improvement of peripheral PI Mura[J]. Chinese journal of liquid crystals and displays, 2018, 33(10): 831-835.
DOI:
Chang-jian XU, Shun-sha LU, Guo-jing MA, et al. Improvement of peripheral PI Mura[J]. Chinese journal of liquid crystals and displays, 2018, 33(10): 831-835. DOI: 10.3788/YJYXS20183310.0831.
Inkjet printing is widely used for PI (Polyimide alignment film) material coating
due to convenient product switching and high capacity. As the technology upgrading
such as high PPI
Borderless
etc.
the challenges of novel PI Mura occurred in inkjet printing process. We research a kind of peripheral PI Mura in this paper. In Pre-cure process
PI solution was accumulated much near the peripheral
via
Hole of array glass
leading to larger inhomogeneous film thickness
which caused the edge dark line mura. We research the process conditions of PI pattern position
Pre-cure temperature
Pre-cure air pressure and PI Thickness. The results reveal that extending edge of PI pattern
lowering Pre-cure temperature
reducing the air pressure and thinning the film effectively decrease accumulation near the peripheral via hole
and induce the defect-free and excellent display
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Keywords
references
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