Xiao-long DONG, Xing-qiang ZHANG, Jun-bo JIANG, et al. Experimental research on exposure process parameter of total pitch in TFT-LCD process[J]. Chinese journal of liquid crystals and displays, 2017, 32(10): 783-786.
DOI:
Xiao-long DONG, Xing-qiang ZHANG, Jun-bo JIANG, et al. Experimental research on exposure process parameter of total pitch in TFT-LCD process[J]. Chinese journal of liquid crystals and displays, 2017, 32(10): 783-786. DOI: 10.3788/YJYXS20173210.0783.
Experimental research on exposure process parameter of total pitch in TFT-LCD process
Based on the theories and monitoring principle of Total Pitch (TP)
we discussed the
X
direction and
Y
direction variation of TP
which changed by pitch value and TP measurement mark. By contrasting the same lay out but different product with the same product but different lay out
we found that TP does not change with the variation of pitch value. However
distortion affects the variation of TP
which can also be called a simplified monitoring points of distortion in the actual process. The acquisition of the interval of TP from NG to OK provides a new idea of optimizing mask design and reducing the distortion of graphics on the glass.
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references
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