Improvement of aluminum corrosion of ADS products by RIE etching mode dry etching

Hui-gang JIANG; Jian-jian GAO; Yan-ming WANG; Hai-sheng ZHAO; Hui WANG; Chao WU

doi:10.3788/YJYXS20173207.0518

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Improvement of aluminum corrosion of ADS products by RIE etching mode dry etching

MaterialScience | 更新时间：2020-08-12

- Improvement of aluminum corrosion of ADS products by RIE etching mode dry etching
- Chinese Journal of Liquid Crystals and Displays Vol. 32, Issue 7, Pages: 518-525(2017)
- 作者机构：
  
  北京京东方光电科技有限公司, 北京 100176
- 作者简介：
- 基金信息：
  
  Supported by BOE Development Fund
- DOI：10.3788/YJYXS20173207.0518
  CLC： TN141.9
- Received：08 March 2017，
  
  Accepted：10 April 2017，
  
  Published：05 July 2017
- 稿件说明：
移动端阅览
Hui-gang JIANG, Jian-jian GAO, Yan-ming WANG, et al. Improvement of aluminum corrosion of ADS products by RIE etching mode dry etching[J]. Chinese journal of liquid crystals and displays, 2017, 32(7): 518-525.
DOI：

Hui-gang JIANG, Jian-jian GAO, Yan-ming WANG, et al. Improvement of aluminum corrosion of ADS products by RIE etching mode dry etching[J]. Chinese journal of liquid crystals and displays, 2017, 32(7): 518-525. DOI： 10.3788/YJYXS20173207.0518.

摘要

Full-in-cell（FIC）产品信号线SD层结构为Mo-Al-Mo结构，使用Reactive Ion Etching（RIE）模式干法刻蚀设备进行N+ Etch时，氯的化合物会吸附在信号线中的Al线侧壁及光刻胶的表面，当玻璃基板离开刻蚀腔体接触到空气，遇到水分发生水解反应，对Al线造成腐蚀，严重影响产品特性。本文在RIE刻蚀模式腔体内采用刻蚀条件变更改善Al腐蚀现象，通过对刻蚀的前处理步骤，后处理步骤以及去静电步骤的参数包括压强、功率和时间以及气体流量比进行实验设计并对数据进行分析。实验结果表明当后处理步骤2 000 W，O

/SF

比例为2 000 mL·min

-1

/50 mL·min

-1

压强为200 mt（1 mt=0.133 Pa），Time为15 s为最优条件，可以彻底改善Al腐蚀现象。此条件TFT特性方面更加优越，Dark

为1.91

A，Photo

off

为4.1 pA。

Abstract

Full-in-cell (FIC) product signal line SD-layer is Mo-Al-Mo structure

when using Reactive Ion Etching (RIE) mode dry etching device for N + etching

the chlorine compounds absorbed on the side wall surface of the Al and photoresist line

when the glass substrate is etched away from the chamber exposed to air

the moisture encountered hydrolysis reaction

which will cause corrosion of Al wire and seriously affect the product characteristics. In this paper

the Al etching phenomenon is improved by changing the etching conditions in the RIE etching mode cavity. Related experimental design and data analysis of the parameters of the pretreatment step

the post-treatment step and the de-static step including the pressure

power and time and the gas ratio is discussed. The experimental results show that the Al corrosion can be improved when the post-treatment step is 2 000 W

the ratio of O

/SF

is 2 000 mL·min

-1

/50 mL·min

-1

the pressure is 200 mt and the time is 15 s. This condition is more advantageous in terms of TFT characteristics

Dark

is 1.91

Photo

off

is 4.1 pA.

关键词

Keywords

references

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