Research and improvement of TFT-LCD Stage Mura

Yang XIAO; Peng ZHOU; Run-bao YAN; Yun-you ZHENG; Qin-rui QI; Chong-xi WEI; Ran ZHANG; Xu ZHANG

doi:10.3788/YJYXS20173204.0269

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Research and improvement of TFT-LCD Stage Mura

Material and Device | 更新时间：2020-07-07

- Research and improvement of TFT-LCD Stage Mura
- Chinese Journal of Liquid Crystals and Displays Vol. 32, Issue 4, Pages: 269-274(2017)
- 作者机构：
  
  北京京东方显示技术有限公司, 北京 100176
- 作者简介：
- 基金信息：
- DOI：10.3788/YJYXS20173204.0269
  CLC： TN141.9
- Received：23 August 2016，
  
  Accepted：18 October 2016，
  
  Published：2017-04
- 稿件说明：
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Yang XIAO, Peng ZHOU, Run-bao YAN, et al. Research and improvement of TFT-LCD Stage Mura[J]. Chinese journal of liquid crystals and displays, 2017, 32(4): 269-274.
DOI：

Yang XIAO, Peng ZHOU, Run-bao YAN, et al. Research and improvement of TFT-LCD Stage Mura[J]. Chinese journal of liquid crystals and displays, 2017, 32(4): 269-274. DOI： 10.3788/YJYXS20173204.0269.

摘要

TFT-LCD面板在屏幕上有斑点或波浪状Mura，影响液晶显示器的品质，经过图形匹配，缺陷与曝光机机台形貌匹配。通过对异常区域特性分析，发现异常区域的BMCD、BM像素间距存在异常。对原因进行模型分析：玻璃在曝光机基台上局部区域发生弯曲，曝光距离变短，致使BMPR受光区域变小，BMCD会偏小，进而导致区域性透过光不均一产生Mura；玻璃弯曲后BM像素间距相对于设计位置也会发生变化，从而导致漏光产生Mura。经过实验验证，BMCD和像素间距的偏差主要由机台凸起导致glass弯曲引起，可以通过降低吸附压力和研磨机台，来改善CD差异和像素间距偏移，同时像素间距偏移漏光，也可以通过增加CD来改善。最终通过BMCD增加、研磨机台和降低吸附压力措施，Stage Mura不良率由10.05%下降至0.11%。

Abstract

The spotted and striped Mura on TFT-LCD Panel degraded product quality. The defect pattern matched the exposure stage by analyzing. It was found that the BM CD and Pixel Pitch are abnormal through researching the abnormal area characteristic parameter. Model analysis based on Stage Mura indicated that the bending of glass on stage shorted the Exposure gap

which shrank the Exposure area

and minified CD and formed transmittance difference. The bending of glass also shifted the Pixel Pitch

which resulted in light leak and Mura. The experiment showed that the difference of BM CD and Pixel Pitch were caused by Stage flatness

which could be improved by polishing stage and decreasing vacuum adsorption pressure. The light leak of Pixel Pitch could be also improved by extending CD. Finally

the CF BM stage Mura was improved greatly by CD increasing

stage polishing

and vacuum adsorption pressure decreasing

and the Stage Mura defect ratio decreased from 10.5% to 0.11%.

关键词

Keywords

references

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