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Ultro-high color gamut and patterned color filter based on quantum dot photoresist
Material and Device | 更新时间：2020-07-07

    • Ultro-high color gamut and patterned color filter based on quantum dot photoresist

    • Chinese Journal of Liquid Crystals and Displays   Vol. 32, Issue 3, Pages: 169-176(2017)

    • DOI：10.3788/YJYXS20173203.0169    

      CLC： TP394.1

    • Received：21 July 2016，

      Accepted：22 August 2016，

      Published：2017-03

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  • Yong-lian QI, Dan WANG, Yun QIU, et al. Ultro-high color gamut and patterned color filter based on quantum dot photoresist[J]. Chinese journal of liquid crystals and displays, 2017, 32(3): 169-176. DOI： 10.3788/YJYXS20173203.0169.

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