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上海交通大学电子工程系TFT-LCD关键材料及技术国家工程实验室 上海,200240
Received:12 December 2015,
Revised:27 December 2015,
Published:05 April 2016
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王东平, 谢应涛, 欧阳世宏等. 薄膜晶体管中绝缘层的研究现状与趋势[J]. 液晶与显示, 2016,31(4): 380-385
WANG Dong-ping, XIE Ying-tao, OUYANG Shi-hong etc. Research status and trends of insulating layer in thin-film transistor[J]. , 2016,31(4): 380-385
王东平, 谢应涛, 欧阳世宏等. 薄膜晶体管中绝缘层的研究现状与趋势[J]. 液晶与显示, 2016,31(4): 380-385 DOI: 10.3788/YJYXS20163104.0380.
WANG Dong-ping, XIE Ying-tao, OUYANG Shi-hong etc. Research status and trends of insulating layer in thin-film transistor[J]. , 2016,31(4): 380-385 DOI: 10.3788/YJYXS20163104.0380.
本文主要介绍了绝缘层在薄膜晶体管中的重要作用
总结了在薄膜晶体管中应用的绝缘层材料种类及其特点
介绍了不同绝缘层的制备工艺
以及各种制备工艺的原理与特点。最后
通过分析近几年有关薄膜晶体管绝缘层的文献
介绍了薄膜晶体管在制备过程中遇到的主要问题及当前的研究热点
并对未来薄膜晶体管中绝缘层的制备工艺和绝缘材料的研究方向进行了展望。
This paper mainly describes the important role of thin film transistor dielectric
and summarizes the dielectric material type and its characteristics in the thin film transistor application
describes the preparation process of different insulation layers
and the principle and characteristic between different processes. Finally
through analysis of the latest literature on thin film transistor dielectric
the paper summarizes the main problems encountered in the preparation process and the current research focus
and finally prospects the future research directions of the technology for preparing thin film transistors and the dielectric materials.
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