Effect of Active Layer Etch Conditions Improvement on TFT-LCD Quality

LI Tian-sheng; XIE Zhen-yu; LI Jing; YAN Chang-jiang; XU Shao-ying; CHEN Xu; MIN Tai-ye

doi:10.3788/YJYXS20132805.0720

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Effect of Active Layer Etch Conditions Improvement on TFT-LCD Quality

Device Physics & Device Technology | 更新时间：2020-08-12

- Effect of Active Layer Etch Conditions Improvement on TFT-LCD Quality
- Chinese Journal of Liquid Crystals and Displays Vol. 28, Issue 5, Pages: 720-725(2013)
- 作者机构：
  
  北京京东方光电科技有限公司北京,100176
- 作者简介：
- 基金信息：
- DOI：10.3788/YJYXS20132805.0720
  CLC： TN141.9
- Received：27 November 2012，
  
  Revised：05 January 2013，
  
  Published：15 October 2013
- 稿件说明：
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李田生, 谢振宇, 李婧, 阎长江, 徐少颖, 陈旭, 闵泰烨. 有源层刻蚀工艺优化对TFT-LCD品质的影响[J]. 液晶与显示, 2013,28(5): 720-725

LI Tian-sheng, XIE Zhen-yu, LI Jing, YAN Chang-jiang, XU Shao-ying, CHEN Xu, MIN Tai-ye. Effect of Active Layer Etch Conditions Improvement on TFT-LCD Quality[J]. , 2013,28(5): 720-725
李田生, 谢振宇, 李婧, 阎长江, 徐少颖, 陈旭, 闵泰烨. 有源层刻蚀工艺优化对TFT-LCD品质的影响[J]. 液晶与显示, 2013,28(5): 720-725 DOI： 10.3788/YJYXS20132805.0720.

LI Tian-sheng, XIE Zhen-yu, LI Jing, YAN Chang-jiang, XU Shao-ying, CHEN Xu, MIN Tai-ye. Effect of Active Layer Etch Conditions Improvement on TFT-LCD Quality[J]. , 2013,28(5): 720-725 DOI： 10.3788/YJYXS20132805.0720.

摘要

TFT-LCD产品为现代显示的主流

如何提高其显示品质成为大家普遍关注的问题

尤其近期发现的过孔发黑(黑点)问题尤为突出

严重影响了产品的良率

降低了产品的品质

文章通过研究发现产生黑点不良的罪魁祸首不是过孔刻蚀的问题

而是有源层刻蚀工艺所导致的

并有针对性地进行了试验设计

分别考察了有源层刻蚀条件、附加一步刻蚀方式对黑点不良的解决效果

根据实验效果附加一步刻蚀方式完美地解决了黑点不良问题

从而将产品的良率提升了3%~4%

而电学性能评价(

:开态电流、

off

:关态电流、

:阈值电压、迁移率)和正常条件相比没有异常

从而获得了最终完美的解决该不良的方案

提高了产品品质。

Abstract

In the trend of TFT-LCD display products

how to improve the quality of display is the main issue we commonly concern about

especially for the defect of black hole which was recently discovered and serious impact on product yield and reduce the quality. The main reasons of black hole were studied. To our surprised

active layer etching process was the main factor not the hole etch process

following with targeted trial design

the active etch condition and additional one step etch process were researched to solve problem. According to the experimental results of the additional one step etch

a solution to enhance product yield of about 3%~4% was found. The electronic parameter measurement was evaluated(

、

off

、

、Mobility) and compared to the normal conditions without exception. Finally

a perfect solution was obtained. Therefore

the products quality was improved.

关键词

Keywords

references

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Related Institution

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