HU Hua-chao, WEI Bing-yan, HU Wei, LU Yan-qing. Applications of Dynamic Mask Based Photolithography in Liquid Crystal Alignment[J]. , 2013,28(2): 199-203
HU Hua-chao, WEI Bing-yan, HU Wei, LU Yan-qing. Applications of Dynamic Mask Based Photolithography in Liquid Crystal Alignment[J]. , 2013,28(2): 199-203 DOI: 10.3788/YJYXS20132802.0199.
Applications of Dynamic Mask Based Photolithography in Liquid Crystal Alignment
A micro-lithography system based on digital micro-mirror device is utilized in liquid crystal (LC) alignments. The projected images on SD1 guide the SDI molecular orientations of the command layer
and further determine the directors of LC. Both complex pattern fabrication and arbitrary polarization control could be accomplished on this system with resolution up to 5 m. Pattern transforming among different bar codes and subarea controlling of random gray scale have been demonstrated by means of the optical rewritability of SD1. These LC devices are switchable and tunable under applied fields. The dynamic LC photo-patterning technique may be widely used in information display and identification
tunable photonic devices
etc.
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references
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