Polysilicon thin film transistors have unique gate capacitance features
that is
the anomalous increase of gate-to-source capacitance in leakage region and gate-to-drain capacitance in kink region. Based on the Meyer model
taking leakage generation effect and kink effect into account
gate-to-source capacitance and gate-to-drain capacitance characteristics are modeled. The good agreement between simulated model results and experimental data confirms the accuracy and efficiency of this model.
关键词
Keywords
references
Meyer J. MOS models and circuit simulation [J]. RCA Review, 1971, 32:42-63.[2] Jacunski M D. Characterization and modeling of short-channel polysilicon thin-film transistors . Charlottesville: Univ. of Virginia, 1997.[3] Bindra S, Haldar S, Gupta R S. Gate capacitance characteristics of a poly-Si thin film transistor [J]. Solid-State Electron., 2004, 48(5):675-681.[4] Chen S S, Shone F C, Kuo J B. A closed-form inversion-type polysilicon thin-film transistor dc/ac model conside-ring the kink effect [J]. J. Appl. Phys., 1995, 77(4):1776-1784.[5] Yang G Y, Hur S H, Han C H. A physical-based analytical turn-on model of polysilicon thin-film transistors for circuit simulation [J]. IEEE Trans. Electron Devices, 1999, 46(1):165-172.[6] Chung S S, Chen D C, Cheng C T, et al. A physically-based built-in spice poly-Si TFT model for circuit simulation and reliability evaluation //Proceedings of the 1996 IEEE International Electron Devices Meeting, Piscataway: IEEE, 1996:139-142.[7] Li C C, Ikeda H, Inoue T, et al. A physical poly-Silicon thin film transistors model for circuit simulations // Proceedings of the 1993 IEEE International Electron Devices Meeting, Piscataway: IEEE, 1993: 497-500.[8] Martin R A, Hack M, Shaw J G, et al. Intrinsic capacitance of amorphous silicon and polysilicon thin film transistors //IEEE International Electron Devices Meeting, Piscataway: IEEE, 1989:361-364.[9] Cadence Design Systems, Inc. Cadence Circuit Components and Device Models Manual [M]. San Jose, USA:Cadence Design Systems, Inc., 2005:1365-1400.