Preparation and Characterization of Al-Ti Co-Doped Zinc Oxide Films

GUO Mei-xia

doi:10.3788/YJYXS20112602.0161

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Preparation and Characterization of Al-Ti Co-Doped Zinc Oxide Films

Table of contents | 更新时间：2020-08-12

- Preparation and Characterization of Al-Ti Co-Doped Zinc Oxide Films
- Chinese Journal of Liquid Crystals and Displays Vol. 26, Issue 2, Pages: 161-164(2011)
- 作者机构：
  
  山东理工大学理学院,山东淄博,255049
- 作者简介：
- 基金信息：
- DOI：10.3788/YJYXS20112602.0161
  CLC： TN304.2
- Received：04 September 2010，
  
  Revised：07 October 2010，
  
  Published Online：06 April 2011，
  
  Published：06 April 2011
- 稿件说明：
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郭美霞. 铝钛共掺杂氧化锌透明导电薄膜的制备与性能研究[J]. 液晶与显示, 2011,26(2): 161-164

GUO Mei-xia. Preparation and Characterization of Al-Ti Co-Doped Zinc Oxide Films[J]. , 2011,26(2): 161-164
郭美霞. 铝钛共掺杂氧化锌透明导电薄膜的制备与性能研究[J]. 液晶与显示, 2011,26(2): 161-164 DOI： 10.3788/YJYXS20112602.0161.

GUO Mei-xia. Preparation and Characterization of Al-Ti Co-Doped Zinc Oxide Films[J]. , 2011,26(2): 161-164 DOI： 10.3788/YJYXS20112602.0161.

摘要

用直流磁控溅射法在玻璃衬底上成功制备出了铝钛共掺杂氧化锌(TAZO)透明导电薄膜

研究了溅射压强对TAZO薄膜的微观结构和光电特性的影响。研究结果表明

所制备的TAZO 薄膜为六角纤锌矿结构的多晶薄膜

且具有

轴择优取向。当溅射压强为7.5 Pa时

薄膜的最小电阻率为3.3410

-4

cm。薄膜的可见光区平均透过率大于89%。溅射压强对薄膜的电阻率和微观结构有显著影响。

Abstract

Transparent conducting Al-Ti co-doped zinc oxide films have been successfully prepared by DC magnetron sputtering. Microstructural

optical and electrical properties of TAZO films are investigated. The experimental results show that all the deposited films are polycrystalline with a hexagonal structure and a preferred orientation perpendicular to the substrates along the

-axis. When the sputtering pressures is 7.5 Pa

the lowest resistivity is 3.3410

-4

cm. All the films present a high transmittance of above 89% in the visible range. The sputtering pressures plays an important role on the microstructure and electrical resistivity of TAZO films.

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Keywords

references

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