LIU Yuan, YAO Ruo-he, LI Bin. Thermal Impedance Model for Amorphous Silicon Thin Film Transistors[J]. , 2011,26(1): 28-33 DOI: 10.3788/YJYXS20112601.0028.
Thermal Impedance Model for Amorphous Silicon Thin Film Transistors
A channel thermal impedance model for amorphous silicon thin film transistor is derived from a system of coupled energy equation
heat flowing equation and boundary conditions. By the use of this model
the average temperature in the active region can be calculated. Then
by considering of the effects of field oxide and interconnects between devices
a two dimensional thermal model is developed. By the use of this model
the temperature distribution in the channel can be described and the maximum junction temperature can be calculated. The accuracy of the proposed model has been verified with the device simulation data.
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