Photoalignment repeatability of azobenzene sulfonic films
Optical Alignment Technology|更新时间:2024-05-29
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Photoalignment repeatability of azobenzene sulfonic films
“The latest research reveals that the photo induced orientation repeat writing performance of azobenzenesulfonic acid SD1 film decreases with increasing erase times under 405 nanowire polarized light irradiation, and the orientation ability significantly weakens after 200 times.”
Chinese Journal of Liquid Crystals and DisplaysVol. 39, Issue 5, Pages: 553-560(2024)
作者机构:
中国科学院 长春光学精密机械与物理研究所,吉林 长春 130033
作者简介:
基金信息:
Supported by National Key R&D Program of China(2021YFB3600300);National Natural ScienceFoundation of China(61975202;U2030101)
YANG Xiaodong, PENG Zenghui, MU Quanquan, et al. Photoalignment repeatability of azobenzene sulfonic films[J]. Chinese journal of liquid crystals and displays, 2024, 39(5): 553-560.
DOI:
YANG Xiaodong, PENG Zenghui, MU Quanquan, et al. Photoalignment repeatability of azobenzene sulfonic films[J]. Chinese journal of liquid crystals and displays, 2024, 39(5): 553-560. DOI: 10.37188/CJLCD.2024-0008.
Photoalignment repeatability of azobenzene sulfonic films