Improvement of sublimation in color film pre-baking process by optimizing the photoresist composition

Run CHEN; Qian JIANG; Peng ZHOU; Qin-rui QI; Xue-song GAO

doi:10.37188/CJLCD.2021-0051

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Improvement of sublimation in color film pre-baking process by optimizing the photoresist composition

Display Technologyand Applications | 更新时间：2021-09-10

- Improvement of sublimation in color film pre-baking process by optimizing the photoresist composition
- Chinese Journal of Liquid Crystals and Displays Vol. 36, Issue 9, Pages: 1273-1282(2021)
- 作者机构：
  
  北京京东方显示技术有限公司, 北京 100176
- 作者简介：
- 基金信息：
- DOI：10.37188/CJLCD.2021-0051
  CLC： O631
- Received：22 February 2021，
  
  Revised：08 April 2021，
  
  Published：2021-09
- 稿件说明：
移动端阅览
Run CHEN, Qian JIANG, Peng ZHOU, et al. Improvement of sublimation in color film pre-baking process by optimizing the photoresist composition[J]. Chinese journal of liquid crystals and displays, 2021, 36(9): 1273-1282.
DOI：

Run CHEN, Qian JIANG, Peng ZHOU, et al. Improvement of sublimation in color film pre-baking process by optimizing the photoresist composition[J]. Chinese journal of liquid crystals and displays, 2021, 36(9): 1273-1282. DOI： 10.37188/CJLCD.2021-0051.

摘要

随着彩膜产线几年的运营，预烘烤工艺升华物带来严重的设备和玻璃基板污染，容易造成曝光工序失败，导致成本浪费。为解决该问题，本文针对8.5世代线红、绿、蓝三条生产线，进行了预烘烤工艺升华物成分分析和改善。经分析，升华物来源于光刻胶中单体和光引发剂，通过将分子量在190~300之间的小分子结构的单体和光引发剂替换成分子量在380~600之间的大分子结构，得到改善型光刻胶，成功将红、绿、蓝3种光刻胶热升华物降低了91.8%，98.5%，93.1%。改善型光刻胶制成的产品光学、信赖性均满足要求，导入量产后，预烘烤升华物导致的玻璃基板曝光工序失败率由3 500×10

-6

降低为1 600×10

-6

。在此研究过程中，提出了一种红绿蓝光刻胶材料预烘烤升华物量化评价指标，可应用于后续光刻胶的开发和选用，对产线长期稳定运营具有参考借鉴意义。

Abstract

With the operation of color filter production line for several years

the sublimation of pre-baking process brings serious equipment and glass substrate pollution

which can easily lead to the failure of exposure process and cost waste. In order to solve this problem

the composition analysis and improvement of sublimation in pre-baking process are carried out for red

green and blue production lines in 8.5 generation line. Sublimation is derived from photoresist. By replacing monomers and photoinitiators with small molecular structure with molecular weight between 190 and 300 into monomers and photoinitiators with macromolecular structure with molecular weight between 380 and 600

the improved photoresist is obtained

and the thermal sublimation of red

green and blue photoresist is successfully reduced by 91.8%

98.5% and 93.1%

respectively. The optical properties and reliability of the improved photoresist are satisfied. After mass production

the exposure failure rate of glass substrate caused by pre-baked sublimation was reduced from 3 500×10

-6

to 1 600×10

-6

. In the course of this study

a quantitative evaluation index of pre-baking sublimation of photoresist material is proposed

which can be applied to the development and selection of photoresist

and has reference significance for the long-term stable operation of production line.

关键词

Keywords

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