Mechanism analysis and improvement of TFT-LCD green Mura

Qian JIANG; Chen-xi GENG; Yi-lin DIAO; Peng ZHOU; Chao-hua LU

doi:10.37188/CJLCD.2020-0337

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Mechanism analysis and improvement of TFT-LCD green Mura

Display Technology and Applications | 更新时间：2021-08-05

- Mechanism analysis and improvement of TFT-LCD green Mura
- Chinese Journal of Liquid Crystals and Displays Vol. 36, Issue 8, Pages: 1136-1143(2021)
- 作者机构：
  
  北京京东方显示技术有限公司, 北京 100176
- 作者简介：
- 基金信息：
- DOI：10.37188/CJLCD.2020-0337
  CLC： TN141.9
- Received：09 December 2020，
  
  Revised：09 April 2021，
  
  Published：2021-08
- 稿件说明：
移动端阅览
Qian JIANG, Chen-xi GENG, Yi-lin DIAO, et al. Mechanism analysis and improvement of TFT-LCD green Mura[J]. Chinese journal of liquid crystals and displays, 2021, 36(8): 1136-1143.
DOI：

Qian JIANG, Chen-xi GENG, Yi-lin DIAO, et al. Mechanism analysis and improvement of TFT-LCD green Mura[J]. Chinese journal of liquid crystals and displays, 2021, 36(8): 1136-1143. DOI： 10.37188/CJLCD.2020-0337.

摘要

色斑不良（Mura）是薄膜晶体管液晶显示器常见的显示缺陷，严重影响产品品质。色斑不良表现形式多样，原因也各不相同。本文针对8.5世代线发生于81.28 cm（32 in）产品上的一种固定位置发绿条状Mura，通过实物解析、设备排查和不同工艺条件试验，对不良机理进行研究。实验结果表明，81.28 cm（32 in）产品彩膜绿像素使用的G-1型光刻胶受光照后性质发生变化是导致该不良的直接原因。进一步确认不良的根本原因为G-1型光刻胶中颜料分子锌酞菁化合物在600~700 nm光波处存在吸收峰，被光照后吸收光子生成自由载流子，形成附加电场，导致该区域液晶偏转异常，显示出宏观绿Mura。从阻隔光照和减少光生载流子产生数量两个方向入手，通过添加高敏感度光起始剂和使用颜色浓度更高的颜料分子，形成两种改善材料，量产导入后，均成功将不良发生率由约20%降低为0，有效提升了产品品质。

Abstract

Mura is a common defect of thin-film transistor liquid crystal display

which seriously affect the quality of the product. Generally

the performances and root causes of Mura are different and require specific analysis. This paper focuses on a fixed position green stripe Mura on a 81.28 cm(32 in) inch product in 8.5 generation line

and studies the defect mechanism through physical analysis

equipment investigation and testing of different producing conditions. The experimental results show that the change of the properties of the G-1 type photoresist used in the green pixel of color filter is the direct cause of the defect. Furthermore

the root cause is confirmed that the zinc phthalocyanine compounds in the G-1 type photoresist have a strong absorption peaks at 600~700 nm of light wave

so it will absorb photons and transform it to free carriers after illumination. The free carriers form additional electric fields

leading to abnormal liquid crystal deflection in this area

showing the macroscopic green Mura. From the two directions of blocking light and reducing the number of photo-generated carriers

two kinds of improved materials are formed by adding high sensitivity light starter and using pigment molecules with higher color concentration. Both material successfully reduce the incidence ratio of the green Mura defect from about 20% to 0

effectively improving the quality of products.

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