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Theoretical model and process parameter analysis of ITO area blackening method for repairing bright spot
Device Physics & Device Preparation | 更新时间:2021-02-07
    • Theoretical model and process parameter analysis of ITO area blackening method for repairing bright spot

    • Chinese Journal of Liquid Crystals and Displays   Vol. 36, Issue 2, Pages: 246-257(2021)
    • DOI:10.37188/CJLCD.2020-0213    

      CLC: TN141.9;TP391.4
    • Received:25 August 2020,

      Revised:18 September 2020,

      Accepted:18 September 2020,

      Published:2021-02

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  • Guo-dong WU, Lv-hua QIAO, Hai-bin HAN, et al. Theoretical model and process parameter analysis of ITO area blackening method for repairing bright spot[J]. Chinese journal of liquid crystals and displays, 2021, 36(2): 246-257. DOI: 10.37188/CJLCD.2020-0213.

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