Effect of Cover Glass on OLED Encapsulation Performance

ZHANG Jing; ZHANG Fang-hui; ZHANG Lin; SHEN Ya-feng; GONG Zheng

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Effect of Cover Glass on OLED Encapsulation Performance

更新时间：2020-08-12

- Effect of Cover Glass on OLED Encapsulation Performance
- Chinese Journal of Liquid Crystals and Displays Vol. 27, Issue 5, Pages: 628-632(2012)
- 作者机构：
  
  1. 陕西科技大学电气与信息工程学院,陕西西安,710021
  2. 西北工业大学材料学院,陕西西安,710021
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN383+.1
- Received：15 June 2012，
  
  Revised：09 July 2012，
  
  Published：15 October 2012
- 稿件说明：
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张静, 张方辉, 张琳, 沈亚峰, 龚政. 玻璃后盖对有机电致发光器件封装性能的影响[J]. 液晶与显示, 2012,(5): 628-632

ZHANG Jing, ZHANG Fang-hui, ZHANG Lin, SHEN Ya-feng, GONG Zheng. Effect of Cover Glass on OLED Encapsulation Performance[J]. , 2012,(5): 628-632
张静, 张方辉, 张琳, 沈亚峰, 龚政. 玻璃后盖对有机电致发光器件封装性能的影响[J]. 液晶与显示, 2012,(5): 628-632 DOI：

ZHANG Jing, ZHANG Fang-hui, ZHANG Lin, SHEN Ya-feng, GONG Zheng. Effect of Cover Glass on OLED Encapsulation Performance[J]. , 2012,(5): 628-632 DOI：

摘要

实验采用玻璃湿法腐蚀凹槽制备了用于有机电致发光器件封装的玻璃后盖

并分析了氢氟酸浓度、温度、超声和反应物对玻璃刻蚀厚度和玻璃表面平整度的影响

得到了一种简单制备玻璃盖的工艺方法: 在氢氟酸浓度为40%

在超声波清洗器中进行玻璃的腐蚀

腐蚀时间为15 min

在腐蚀过程中间隔一定时间冲洗反应物后可以得到厚度为0.177 mm

表面平整的玻璃封装盖

符合有机电致发光器件的封装要求。使用此方法制备的封装盖在氮气环境下将有机电致发光器件进行封装

可以减缓器件亮度的衰减。

Abstract

Cover glass for OLED encapsulation was made by wet etching technology. The impact of concentration of hydrofluoric acid

temperature

ultrasound and reactant on thickness and surface smoothness was studied. The best method to make cover glass was obtained: In the ultrasonic cleaner

the concentration of hydrofluoric acid was 40%

corrosion time was 15 min and the corrosion process cleared the reactant

then we got 0.177 mm smooth surface cover glass

which was coincident with the encapsulation standard of organic electroluminescent devices. Organic Light-Emitting Diodes were encapsulated using cover glass made by this method in a nitrogen atmosphere

the attenuation rate of luminance of these devices can be slowed down.

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Keywords

references

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郑志霞,林雁飞,冯勇建.7740玻璃湿法腐蚀凹槽及槽内光刻图形的研究 [J]. 厦门大学学报,2005,44(3):370-372.

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吕文辉,张帅.图形化硅纳米线阵列场发射阴极的制备及其场发射性能 [J]. 液晶与显示,2011,26(4):486-489.

Iliescu C,Jing J,Tay F EH, et al. Characterization of masking layers for deep wet etching of glass in an improved HF/HClsolution [J].Surface & Coatings Technology, 2005,198:314-318.

陈金鑫,陈锦地,吴忠帜. 白光OLED照明 [M].上海: 上海交通大学出版社,2011.

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